William J. Simmons
Product Engineer at Brewer Science Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Scanning electron microscopy, Photoresist materials, Plasma etching, Semiconducting wafers, Photoresist developing, Plasma

Proceedings Article | 2 June 2000 Paper
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Semiconductors, Optical lithography, Etching, Metals, Copper, Dielectrics, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Photoresist processing

Proceedings Article | 14 June 1999 Paper
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Oxides, Lithography, Deep ultraviolet, Etching, Polymers, Coating, Reflectivity, Photoresist materials, Critical dimension metrology, Prototyping

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