Dr. Willie J. Yarbrough
Senior Member/Technical Staff
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 17 March 2006 Paper
Proceedings Volume 6156, 615616 (2006) https://doi.org/10.1117/12.660120
KEYWORDS: SRAF, Printing, Optical proximity correction, Lithographic illumination, Fiber optic illuminators, Lithography, Logic devices, Photomasks, Metals, Logic

Proceedings Article | 7 July 1997 Paper
Pat Watson, Joseph Garofalo, M. Hansen, Ilya Grodnensky, Ludwik Zych, R. Takahashi, Willie Yarbrough, Edward Ehrlacher, A. Reim, R. Vella, A. Dunbar, Albert Colina, B. Herrero, D. Castro
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275997
KEYWORDS: Lithographic illumination, Lithography, Optical proximity correction, Critical dimension metrology, Manufacturing, SRAF, Reticles, Photomasks, Matrices

Proceedings Article | 27 December 1996 Paper
Joseph Garofalo, Pat Watson, Lee Trimble, Raymond Cirelli, Albert Colina, Ilya Grodnensky, B. Herrero, A. Dunbar, Frederick Peiffer, R. Takahashi, Regine Tarascon-Auriol, Willie Yarbrough, Ludwik Zych
Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262814
KEYWORDS: Photomasks, Optical proximity correction, Deep ultraviolet, Lithography, Resolution enhancement technologies, Semiconducting wafers, Binary data, Mask making, Process modeling, Optical lithography

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