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Wim de Laat
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 21 March 2008 Paper
Submicron patterning on flexible substrates by reduction optical lithography
Wim de Laat, Mária Péter, François Furthner, Peter Giesen, Cheng-Qun Gui, Erwin Meinders
Proceedings Volume 6921, 69212F (2008) https://doi.org/10.1117/12.771947
KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Transistors, Image processing, Optical fiber cables, Critical dimension metrology, Scanning electron microscopy, Thin films, Silicon
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