Winfried M. Kaiser
Retired at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 1160905 (2021) https://doi.org/10.1117/12.2583640
KEYWORDS: Extreme ultraviolet lithography, Sensors, Scanners, Projection systems, Printing, Optical lithography, Mirrors, Lens design, High volume manufacturing, Device simulation

Proceedings Article | 7 January 2021 Presentation + Paper
Proceedings Volume 11517, 1151712 (2021) https://doi.org/10.1117/12.2572932
KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Printing, Optical lithography, Device simulation, Projection systems, Buildings

Proceedings Article | 23 March 2020 Paper
Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmerman, Paul Graeupner, Lars Wischmeier, Peter Kuerz, Winfried Kaiser
Proceedings Volume 11323, 1132307 (2020) https://doi.org/10.1117/12.2551491
KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Scanners, Extreme ultraviolet, Photoresist materials, Optics manufacturing, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Lars Wischmeier, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Jan van Schoot, Joerg Mallmann, Joost de Pee, Judon Stoeldraijer
Proceedings Volume 11323, 1132308 (2020) https://doi.org/10.1117/12.2543308
KEYWORDS: Light sources and illumination, Lithographic illumination, Mirrors, Metrology, EUV optics, Projection systems, Optics manufacturing, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 16 October 2019 Presentation
Proceedings Volume 11147, 1114710 (2019) https://doi.org/10.1117/12.2538325
KEYWORDS: Extreme ultraviolet lithography, Photomasks, High volume manufacturing, Scanners, Lens design, Sensors, Thermography, Pellicles

Showing 5 of 29 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 8 November 2000

Conference Committee Involvement (9)
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Showing 5 of 9 Conference Committees
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