Dr. Wojtek J. Walecki Profile

Dr. Wojtek J. Walecki

at Optoprofiler LLC

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 4 March 2019 Presentation

Stress metrology for flexible and flat-panel display manufacturing (Conference Presentation)

Wei-Chun Hung, Raphael Morency, Wojtek Walecki

Proc. SPIE. 10925, Photonic Instrumentation Engineering VI

KEYWORDS: Near infrared, Metrology, Birefringence, Cameras, Sensors, Silicon, Manufacturing, Semiconductor manufacturing, Flat panel displays, Mechanical engineering

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Proceedings Article | 18 August 2018 Presentation + Paper

Synchronized real-space and frequency-domain low-coherence interferometry for wafer thickness and metrology applications

Raphael Morency, Wei Chun Hung, Wojtek Walecki

Proc. SPIE. 10749, Interferometry XIX

KEYWORDS: Metrology, Clocks, Interferometers, Error analysis, Spectrometers, Interferometry, Multiplexing, Time metrology, Semiconducting wafers, Space reconnaissance

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Proceedings Article | 18 August 2018 Presentation + Paper

One part-per-million wafer thickness measurement repeatability using fast frequency space Moire effect tool

Wei Chun Hung, Raphael Morency, Wojtek Walecki

Proc. SPIE. 10749, Interferometry XIX

KEYWORDS: Wafer-level optics, Semiconductors, Fabry–Perot interferometers, Moire patterns, Metrology, Spectroscopy, Silicon, Interferometry, Free space optics, Semiconducting wafers

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Proceedings Article | 19 February 2018 Paper

Stress metrology for flat-panel displays G6 and bigger

Wojtek Walecki

Proc. SPIE. 10556, Advances in Display Technologies VIII

KEYWORDS: Thin films, Metrology, Light emitting diodes, Glasses, Data processing, Signal processing, Flat panel displays, Flat glass, Coded apertures, Thin film deposition

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Proceedings Article | 23 August 2017 Paper

Metrology of semiconductor structures using novel Fabry Perot fringe stretching system

Wojtek Walecki, Alexander Pravdivtsev

Proc. SPIE. 10373, Applied Optical Metrology II

KEYWORDS: Wafer-level optics, Semiconductors, Fabry–Perot interferometers, Metrology, Spectrometers, Silicon, Optical testing, Semiconductor manufacturing, Phase measurement, Semiconducting wafers

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Proceedings Article | 9 March 2015 Paper

Robust diffuser and roughness metrology tool for LED manufacturing

Wojtech Walecki, Peter Walecki

Proc. SPIE. 9383, Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XIX

KEYWORDS: Metrology, Light emitting diodes, Nickel, Manufacturing, Reflectivity, Surface roughness, Diffusers, Specular reflections, Optics manufacturing, Surface finishing

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Proceedings Article | 1 June 2011 Paper

Dispersion free all reflective confocal microscope objective

Wojtek Walecki, Mike Scaggs, Peter Walecki, Fanny Szondy

Proc. SPIE. 8036, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

KEYWORDS: Confocal microscopy, Microscopes, Mirrors, Multiphoton microscopy, Polarization, Reflection, Microscopy, Reflectivity, Objectives, Stimulated emission depletion microscopy

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Proceedings Article | 30 April 2009 Paper

Fiber optics low-coherence IR interferometry for defense sensors manufacturing

Wojtek Walecki, Fanny Szondy

Proc. SPIE. 7322, Photonic Microdevices/Microstructures for Sensing

KEYWORDS: Optical fibers, Fiber optics, Polarization, Interferometers, Sensors, Reflectivity, Fiber optics sensors, Semiconducting wafers, Optics manufacturing, Michelson interferometers

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Proceedings Article | 10 September 2008 Paper

Integrated quantum efficiency, topography, and stress metrology for solar cell manufacturing: real space approach

Wojtek Walecki, Fanny Szondy

Proc. SPIE. 7048, Reliability of Photovoltaic Cells, Modules, Components, and Systems

KEYWORDS: Metrology, Cameras, Solar cells, Remote sensing, Quantum efficiency, Manufacturing, LCDs, Projection systems, Semiconducting wafers, Structured light

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Proceedings Article | 11 August 2008 Paper

Integrated quantum efficiency, reflectance, topography and stress metrology for solar cell manufacturing

Wojtek Walecki, Fanny Szondy

Proc. SPIE. 7064, Interferometry XIV: Applications

KEYWORDS: Metrology, Cameras, Solar cells, Quantum efficiency, Manufacturing, Reflectivity, Projection systems, Semiconducting wafers, Phase shifts, Structured light

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Proceedings Article | 12 February 2008 Paper

Efficient calibration algorithm, and calibration pattern for correcting distortions for three-dimensional image acquisition systems for microscopic applications

Wojtek Walecki, Fanny Szondy

Proc. SPIE. 6861, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XV

KEYWORDS: Eye, Edge detection, 3D acquisition, Detection and tracking algorithms, Imaging systems, Cameras, Calibration, Image acquisition, Coded apertures, 3D image processing

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Proceedings Article | 14 August 2006 Paper

High-speed high-accuracy fiber optic low-coherence interferometry for in situ grinding and etching process monitoring

Wojciech Walecki, Alexander Pravdivtsev, Manuel Santos, Ann Koo

Proc. SPIE. 6293, Interferometry XIII: Applications

KEYWORDS: Optical fibers, Mirrors, Visible radiation, Coherence (optics), Fiber optics, Interferometers, Sensors, Scanners, Infrared radiation, Semiconducting wafers

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Proceedings Article | 14 August 2006 Paper

Fast and accurate non-contact in situ optical metrology for end-point detection

Wojciech Walecki, Alexander Pravdivstev, Manuel Santos, Ann Koo

Proc. SPIE. 6292, Interferometry XIII: Techniques and Analysis

KEYWORDS: Wafer-level optics, Optical fibers, Mirrors, Coherence (optics), Fiber optics, Interferometers, Etching, Scanners, Silicon, Semiconducting wafers

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Proceedings Article | 23 January 2006 Paper

Combined low-coherence interferometry and spectrally resolved reflectometry for nondestructive characterization of small-diameter high-aspect ratio micro-fabricated and micro-machined structures and multilayer membranes

Wojciech Walecki, Talal Azfar, Alexander Pravdivstev, Manuel Santos, Ann Koo

Proc. SPIE. 6109, Micromachining and Microfabrication Process Technology XI

KEYWORDS: Thin films, Refractive index, Fiber optics, Interferometers, Sensors, Silicon, Reflectivity, Interferometry, Reflectometry, Semiconducting wafers

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Proceedings Article | 6 January 2006 Paper

Novel combined low-coherence interferometry spectrally resolved reflectometry compatible with high-resolution Raman spectroscopy for nondestructive characterization of MEMS structures

Wojciech Walecki, Talal Azfar, Alexander Pravdivstev, Manuel Santos, Tim Wong, Aiguo Feng, Ann Koo

Proc. SPIE. 6111, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS V

KEYWORDS: Microelectromechanical systems, Interferometers, Sensors, Spectroscopy, Silicon, Interferometry, Raman spectroscopy, Reflectometry, Infrared radiation, Semiconducting wafers

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Proceedings Article | 18 August 2005 Paper

Synchronized low coherence interferometry for in-situ and ex-situ metrology for semiconductor manufacturing

Wojciech Walecki, Alexander Pravdivtsev, Kevin Lai, Manuel Santos, Ann Koo

Proc. SPIE. 5880, Optical Diagnostics

KEYWORDS: Semiconductors, Metrology, Coherence (optics), Interferometers, Silicon, Reflectivity, Interferometry, Semiconductor manufacturing, Semiconducting wafers, Michelson interferometers

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Proceedings Article | 22 January 2005 Paper

Low-coherence interferometric absolute distance gauge for study of MEMS structures

Wojciech Walecki, Kevin Lai, Alexander Pravdivtsev, Vitali Souchkov, Phuc Van, Talal Azfar, Tim Wong, S. H. Lau, Ann Koo

Proc. SPIE. 5716, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS IV

KEYWORDS: Microelectromechanical systems, Optical fibers, Refractive index, Beam splitters, Metrology, Interferometers, Sensors, Interferometry, Distance measurement, Semiconducting wafers

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Proceedings Article | 23 December 2003 Paper

Novel low coherence metrology for nondestructive characterization of high aspect ratio micro-fabricated and micro-machined structures

Wojciech Walecki, Frank Wei, Phuc Van, Kevin Lai, Tim Lee, S. Lau, Ann Koo

Proc. SPIE. 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III

KEYWORDS: Microelectromechanical systems, Beam splitters, Metrology, Coherence (optics), Reflection, Sensors, Interferometry, Nondestructive evaluation, Semiconducting wafers, Signal detection

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Proceedings Article | 12 April 2001 Paper

Development and characterization of advanced F2 laser source for 157-nm lithography

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Sergei Govorkov, Gongxue Hua, Wojciech Walecki

Proc. SPIE. 4347, Laser-Induced Damage in Optical Materials: 2000

KEYWORDS: Laser sources, Lithography, Laser induced damage, Silver, Reliability, Laser applications, Laser development, Laser marking, Fourier transforms, Laser components

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Proceedings Article | 12 April 2001 Paper

Reliable materials and instruments for 157-nm lithography

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Wojciech Walecki, Dirk Basting

Proc. SPIE. 4347, Laser-Induced Damage in Optical Materials: 2000

KEYWORDS: Semiconductors, Optical components, Lithography, Metrology, Optical lithography, Silver, Optical testing, Profiling, Vacuum ultraviolet, Beam analyzers

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Proceedings Article | 8 November 2000 Paper

Extreme-ultraviolet source development: a comparison of different concepts

Guido Schriever, Manfred Rahe, Ulrich Rebhan, Dirk Basting, Wojciech Walecki, Hans Lauth, Rainer Lebert, Klaus Bergmann, Dieter Hoffmann, Oliver Rosier, Willi Neff, Reinhart Poprawe, Roland Sauerbrey, H. Schwoerer, S. Duesterer, C. Ziener, Peter Nickles, H. Stiehl, Ingo Will, Wolfgang Sandner, Guenther Schmahl, Dietbert Rudolph

Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems

KEYWORDS: Spectrographs, Metrology, High power lasers, Laser applications, Laser development, Extreme ultraviolet, Pulsed laser operation, Prototyping, Plasma, Laser systems engineering

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Showing 5 of 21 publications

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