Dr. Wolfgang Demmerle
Marketing Manager at Synopsys GmbH
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 15 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Line edge roughness, Stochastic processes

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Stochastic processes

Proceedings Article | 4 April 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Computer simulations, 3D modeling, Photomasks, Extreme ultraviolet, Computational lithography, Optical proximity correction, Photoresist processing, Performance modeling, Resolution enhancement technologies

Proceedings Article | 6 September 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Error analysis, Computer simulations, Directed self assembly, Extreme ultraviolet lithography, Critical dimension metrology, Process modeling

Proceedings Article | 27 April 2017 Presentation + Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Nanotechnology, Logic, Optical lithography, Data modeling, Calibration, 3D modeling, Very large scale integration, Research facilities, System on a chip

Showing 5 of 22 publications
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