Wolfgang Harnisch
Director at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Multilayers, Metrology, Scanners, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beam lithography, Light sources, Metrology, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Airborne remote sensing, EUV optics, Plasma

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Airborne remote sensing

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Metrology, Imaging systems, Scanners, Photons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Zone plates, EUV optics

Showing 5 of 14 publications
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