Won-Kwang Ma
at SK Hynix Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Etching, Scanners, Materials processing, Bridges, Photomasks, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Data modeling, Etching, Photomasks, Extreme ultraviolet, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Signal processing, Thermal effects, Process control, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies, Chemical mechanical planarization

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Calibration, Scanners, Materials processing, Photomasks, Immersion lithography, Optical alignment, Thin film coatings, Semiconducting wafers, Overlay metrology, Protactinium

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Diffraction, Refractive index, Contamination, Lithographic illumination, Reliability, Scanning electron microscopy, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top