Won Sun Kim
Research Staff Member at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Inspection, SRAF, Optical proximity correction, Artificial intelligence, Defect detection, Semiconducting wafers, Photomasks, Reticles, Model-based design, Image resolution

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer inspection, Reticles, SRAF, Optical proximity correction, Lithography, Contamination, Image resolution

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Inspection, Reticles, Double patterning technology, Defect detection, Critical dimension metrology, Ear, Semiconducting wafers, Photomasks, Defect inspection, Radon

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Inspection, Lamps, Photomasks, Deep ultraviolet, Defect detection, SRAF, Particles, Defect inspection, Manufacturing, Resolution enhancement technologies

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