Dr. Won D. Kim Profile

Dr. Won D. Kim

Principal Engineer at ASML US Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 10 April 2013 Paper

Paper

CD optimization methodology for extending optical lithography

C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

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Proceedings Article | 4 April 2012 Paper

Paper

High-order wafer alignment in manufacturing

Michael Pike, Nelson Felix, Vinayan Menon, Christopher Ausschnitt, Timothy Wiltshire, Sheldon Meyers, Won Kim, Blandine Minghetti

Proceedings Volume 8324, 832408 (2012) https://doi.org/10.1117/12.916483

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Manufacturing, Control systems, Semiconductor manufacturing, Data modeling, Process control, Metrology

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Proceedings Article | 2 April 2011 Paper

Paper

Model-based scanner tuning for process optimization

Rafael Aldana, Venu Vellanki, Wenjin Shao, Ronald Goossens, Zongchang Yu, Xu Xie, Yu Cao, Koen Schreel, Peter Lee, Won Kim, Tjitte Nooitgedagt

Proceedings Volume 7985, 79850L (2011) https://doi.org/10.1117/12.882764

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Critical dimension metrology, Metrology, Optimization (mathematics), Printing, Data modeling, Photomasks, Model-based design

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Proceedings Article | 4 November 2005 Paper

Paper

Advanced reticle inspection challenges and solutions for 65nm node

Won Kim, Mark Eickhoff, David Kim, Sandy McCurley

Proceedings Volume 5992, 59920C (2005) https://doi.org/10.1117/12.632322

KEYWORDS: Inspection, Photomasks, Contamination, Reticles, Semiconducting wafers, SRAF, Manufacturing, Resolution enhancement technologies, Lithography, Sensors

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Proceedings Article | 12 May 2005 Paper

Paper

65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Gary Zhang, Mark Terry, Sean O'Brien, Robert Soper, Mark Mason, Won Kim, Changan Wang, Steven Hansen, Jason Lee, Joe Ganeshan

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600409

KEYWORDS: SRAF, Critical dimension metrology, Optical proximity correction, Photomasks, Scanners, Lithographic illumination, Semiconducting wafers, Phase shifts, Lithography, Resolution enhancement technologies

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Proceedings Article | 10 May 2005 Paper

Paper

Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Osman Sorkhabi, Heath Pois, Hanyou Chu, Youxian Wen, Jon Opsal, Won Kim

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598955

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Process control, Metrology, Inspection, Data modeling, Reflectometry, Spectroscopy, Optical lithography, Lithography

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Proceedings Article | 17 December 2003 Paper

Paper

Mask challenges and capability development for the 65-nm device technology node: the first status report

Won Kim, Christopher Aquino, Mark Eickhoff, Phillip Lim, Nobuhiko Fukuhara, Scott Jessen, Yasutaka Kikuchi, Junichi Tanzawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518205

KEYWORDS: SRAF, Photomasks, Inspection, Resolution enhancement technologies, Printing, Solids, Lithography, Mask making, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Paper

Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks

Won Kim, Shinji Akima, Christopher Aquino, Charika Becker, Mark Eickhoff, Tsuyoshi Narita, Soo-Kim Quah, Peter Rohr, Robert Schlaffer, Junichi Tanzawa, Yoshiro Yamada

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468084

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Binary data, Lithography, Standards development, Printing, Defect detection, Photoresist processing, Wafer testing

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Proceedings Article | 1 August 2002 Paper

Paper

CD variations from nontrivial mask-related factors

Z. Mark Ma, Won Kim, Benjamen Rathsack, Guoqiang Xing, Mark Somervell, Hyesook Hong

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476928

KEYWORDS: Photomasks, Critical dimension metrology, Pellicles, Semiconducting wafers, Reticles, Calibration, Etching, Photoresist processing, Process control, Metrology

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Proceedings Article | 30 July 2002 Paper

Paper

OPC rectification of random space patterns in 193-nm lithography

Mosong Cheng, Andrew Neureuther, Keeho Kim, Z. Mark Ma, Won Kim, Maureen Hanratty

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474512

KEYWORDS: Optical proximity correction, Critical dimension metrology, Cadmium sulfide, Scanning electron microscopy, Process modeling, Photomasks, Printing, Lithography, Calibration, 193nm lithography

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Proceedings Article | 30 July 2002 Paper

Paper

Aerial image degradation effects due to imperfect sidewall profiles of EAPSM mask for 130-nm device node: 3D EMF simulations and wafer printing results

Won Kim, Benjamen Rathsack

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474576

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Attenuators, Quartz, Printing, Etching, Optical lithography, 193nm lithography, Nanoimprint lithography

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Proceedings Article | 11 March 2002 Paper

Paper

Wafer FAB experience of implementing 50-kV vector e-beam mask writer and dry etch process for 130-nm technology node generation

Won Kim, Robert Bennett, Z. Mark Ma

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458310

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Etching, Dry etching, Photoresist processing, Scanning electron microscopy, Photomicroscopy, Mask making, Optical proximity correction

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Proceedings Article | 24 August 2001 Paper

Paper

Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform

Keeho Kim, Gregory Wells, Won Kim, Yong-Jun Choi, Se-Jin Choi, Yang-Sook Kim, Deog-Bae Kim

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436846

KEYWORDS: Diffractive optical elements, Photomasks, Lithography, Line edge roughness, Monochromatic aberrations, Scanners, Photoresist processing, Scanning electron microscopy, Manufacturing, Etching

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Proceedings Article | 20 October 2000 Paper

Paper

Hardmask/BARC materials for 157-nm lithography

Won Kim, Daniel Miller, Hyeong-Soo Kim, Jeff Byers, Mike Daniels, Britton Birmingham, James Tompkins

Proceedings Volume 4226, (2000) https://doi.org/10.1117/12.404844

KEYWORDS: Etching, Lithography, Dielectrics, Silicon, Silicon carbide, Optical lithography, Absorption, Photoresist processing, Tin, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Paper

Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication

Keeho Kim, Mark Mason, John Randall, Won Kim

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388957

KEYWORDS: Photomasks, Lithography, Deep ultraviolet, Critical dimension metrology, Electroluminescence, Optical lithography, Semiconducting wafers, Optical proximity correction, Printing, 193nm lithography

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Proceedings Article | 23 June 2000 Paper

Paper

193-nm thin-layer imaging performance of 140-nm contact hole patterning and DOE dry development process optimization of multilayer resist process

Won Kim, Sung-Bo Hwang, Georgia Rich, Victoria Graffenberg

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388267

KEYWORDS: Etching, Diffractive optical elements, Semiconducting wafers, Photoresist processing, Lithography, Photomasks, Plasma etching, Plasma, Image processing, Reactive ion etching

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Showing 5 of 16 publications

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