Dr. Won D. Kim
Principal Engineer at ASML US Inc
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 4 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Contamination, Sensors, Manufacturing, Inspection, Photomasks, SRAF, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Showing 5 of 16 publications
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