CONFERENCE PROCEEDINGS
Advanced Search
Wonjoo Park
at Samsung Electronics
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 10 May 2016 Paper
The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information
Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496
KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top