Dr. Woojoo Sim Profile

Dr. Woojoo Sim

Senior Engineer at SAMSUNG Electronics Co Ltd

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Publications (4)

Proceedings Article | 20 March 2019 Presentation + Paper

Automatic correction of lithography hotspots with a deep generative model

Woojoo Sim, Kibok Lee, Dingdong Yang, Jaeseung Jeong, Ji-Suk Hong, Sooryong Lee, Honglak Lee

Proc. SPIE. 10961, Optical Microlithography XXXII

KEYWORDS: Lithography, Photomasks, Neural networks, Data modeling, Process modeling, Image classification, Binary data, Image processing, Computational lithography

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Proceedings Article | 23 March 2011 Paper

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, H. J. Lee, W. J. Sim, M. J. Hong, S. G. Jung, S. S. Suh, S. W. Lee

Proc. SPIE. 7973, Optical Microlithography XXIV

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

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Proceedings Article | 23 March 2011 Paper

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyun-Jong Lee, Sungsoo Suh, Jung-Hoon Ser, Seong-Woon Choi, Chang-Jin Kang, Thomas Cecil, Christopher Ashton, David Irby, Xin Zhou, D.H. Son, Guangming Xiao, David Kim

Proc. SPIE. 7973, Optical Microlithography XXIV

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

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Proceedings Article | 29 September 2010 Paper

Improving model prediction accuracy for ILT with aggressive SRAFs

Sunggon Jung, Woojoo Sim, Moongyu Jeong, Junghoon Ser, Sungwoo Lee, Seoung-woon Choi, Xin Zhou, Lan Luan, Thomas Cecil, Donghwan Son, Robert Gleason, David Kim

Proc. SPIE. 7823, Photomask Technology 2010

KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

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