Dr. Xiaobo Xie Profile

Dr. Xiaobo Xie

Senior Engineer at ASML

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 28 April 2023 Presentation + Paper

Physical dose modeling and throughput optimization in EUV computational lithography

Austin Peng, Christopher Kaplan, Jeff Lu, Michael Crouse, Zuanyi Li, Xiaobo Xie, David Rio, Achim Woessner, Alexander Tan, Cuiping Zhang, Xiaoyang Li, Dezheng Sun, Stephen Hsu, Rafael Howell, Joerg Zimmermann

Proceedings Volume 12494, 124940C (2023) https://doi.org/10.1117/12.2657454

KEYWORDS: Source mask optimization, Computational lithography, Nanoimprint lithography, Extreme ultraviolet, Semiconducting wafers, Scanners, Modeling, Reticles, Artificial intelligence, Light sources and illumination

Read Abstract +

Proceedings Article | 26 February 2021 Presentation

Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

Will Conley, Vince Vince Plachecki, Stephen Hsu, Michael Crouse, Rongkuo Zhao, John He, Pieter Scheijgrond, Dezheng Sun, Xiaoyang Li, Dongqing Zhang, Ming-Chun Tien, Jun Ye, Rafael Howell, Chen Liu, Xiaolong Zhang, Hai Li, Zuanyi Li, Xiaobo Xie, Jing Su, Yzzer Roman

Proceedings Volume 11613, 116130E (2021) https://doi.org/10.1117/12.2585651

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Fast 3D thick mask model for full-chip EUVL simulations

Peng Liu, Xiaobo Xie, Wei Liu, Keith Gronlund

Proceedings Volume 8679, 86790W (2013) https://doi.org/10.1117/12.2010818

KEYWORDS: Photomasks, 3D modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Finite-difference time-domain method, Semiconducting wafers, Lithography, Optical proximity correction, Reflectivity

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects

Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon

Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000

KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection

Read Abstract +

Proceedings Article | 30 August 2006 Paper

Information processing with spectral decomposition of ultrafast pulses in the time domain

Robert Saperstein, Nikola Alic, Dmitriy Panasenko, Xiaobo Xie, Paul Yu, Yeshaiahu Fainman

Proceedings Volume 6311, 63111F (2006) https://doi.org/10.1117/12.686730

KEYWORDS: Microwave radiation, Modulation, Picosecond phenomena, Modulators, Ultrafast phenomena, Dispersion, Signal processing, Spectrum analysis, Satellites, Polarization

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years