Dr. Xiaohai Li
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Monte Carlo methods, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Image resolution, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Neodymium, Surface conduction electron emitter displays

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Roads, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Laser induced breakdown spectroscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Diffraction, Calibration, Image processing, Manufacturing, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Roads, Lithographic illumination, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Model-based design, Process modeling

Showing 5 of 8 publications
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