Dr. Xiaolong Wang Profile

Dr. Xiaolong Wang

at PSI

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 29 March 2021 Presentation + Paper

Progress in EUV resist screening towards the deployment of high-NA lithography

T. Allenet, X. Wang, M. Vockenhuber , C.-K. Yeh, I. Mochi, J. Santaclara, L. Van Lent-Protasova, Y. Ekinci

Proceedings Volume 11609, 116090J (2021) https://doi.org/10.1117/12.2583983

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, Light sources, Laser sintering, High volume manufacturing, Chemically amplified resists

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Proceedings Article | 4 May 2020 Presentation + Paper

Progress in EUV resists status towards high-NA EUV lithography

Xiaolong Wang, Li-Ting Tseng, Timothee Allenet, Iacopo Mochi, Michaela Vockenhuber, Chia-Kai Yeh, Lidia van Lent-Protasova, Jara Garcia Santaclara, Rolf Custers, Yasin Ekinci

Proceedings Volume 11323, 113230C (2020) https://doi.org/10.1117/12.2551886

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Fourier transforms, Diffraction gratings, Printing, Lithography, Electroluminescence, Optical lithography

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Proceedings Article | 9 October 2019 Presentation + Paper

Progress overview of EUV resists status towards high-NA EUV lithography

Xiaolong Wang, Li-Ting Tseng, Iacopo Mochi, Michaela Vockenhuber, Lidia van Lent-Protasova, Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci

Proceedings Volume 11147, 1114711 (2019) https://doi.org/10.1117/12.2536923

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Diffraction gratings, Scanning electron microscopy, Printing, Photomasks, Lithography

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Proceedings Article | 29 August 2019 Paper

Progress in EUV resists for contact holes printing using EUV interference lithography

Xiaolong Wang, Li-Ting Tseng, Iacopo Mochi, Michaela Vockenhuber , Lidia van Lent-Protasova, Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci

Proceedings Volume 11177, 111770U (2019) https://doi.org/10.1117/12.2535678

KEYWORDS: Extreme ultraviolet, Printing, Extreme ultraviolet lithography, Lithography, Diffraction gratings, Scanning electron microscopy, Photomasks, Line edge roughness, Light sources

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Proceedings Article | 29 May 2019 Presentation + Paper

Progress in EUV resists towards high-NA EUV lithography

Xiaolong Wang, Zuhal Tasdemir, Iacopo Mochi, Michaela Vockenhuber, Lidia van Lent-Protasova, Marieke Meeuwissen, Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci

Proceedings Volume 10957, 109570A (2019) https://doi.org/10.1117/12.2516260

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Diffraction gratings, Scanning electron microscopy, Lithography, Electroluminescence, Critical dimension metrology, Optical lithography, Semiconductors

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SPIE Journal Paper | 14 January 2019

Studying resist performance for contact holes printing using EUV interference lithography

Xiaolong Wang, Li-Ting Tseng, Dimitrios Kazazis, Zuhal Tasdemir, Michaela Vockenhuber, Iacopo Mochi, Yasin Ekinci

JM3, Vol. 18, Issue 01, 013501, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013501

KEYWORDS: Polarization, Extreme ultraviolet, Lithography, Photomasks, Diffraction gratings, Printing, Extreme ultraviolet lithography, Diffraction, Semiconducting wafers, Silicon

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Proceedings Article | 26 October 2018 Paper

Evaluation of EUV resists for 5nm technology node and beyond

Zuhal Tasdemir, Xiaolong Wang, Iacopo Mochi, Lidia van Lent-Protasova, Marieke Meeuwissen , Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci

Proceedings Volume 10809, 108090L (2018) https://doi.org/10.1117/12.2502688

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Photomasks, Diffraction gratings, Semiconductor manufacturing, High volume manufacturing, Lithography, Light sources, Laser sintering

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Proceedings Article | 12 October 2018 Paper

Studying resist performance for contact holes printing using EUV interference lithography

Xiaolong Wang, Li-Ting Tseng, Dimitrios Kazazis, Zuhal Tasdemir , Michaela Vockenhuber, Iacopo Mochi, Yasin Ekinci

Proceedings Volume 10809, 108091Z (2018) https://doi.org/10.1117/12.2501949

KEYWORDS: Polarization, Photomasks, Extreme ultraviolet, Diffraction gratings, Lithography, Diffraction, Semiconducting wafers, Printing, Extreme ultraviolet lithography, Silicon

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Showing 5 of 8 publications

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