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Dr. Xin Guo
at ASML
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Author
Publications (1)
Proceedings Article | 25 March 2016 Paper
A physical resist shrinkage model for full-chip lithography simulations
Peng Liu, Leiwu Zheng, Maggie Ma, Qian Zhao, Yongfa Fan, Qiang Zhang, Mu Feng, Xin Guo, Tom Wallow, Keith Gronlund, Ronald Goossens, Gary Zhang, Yenwen Lu
Proceedings Volume 9779, 97790Y (2016) https://doi.org/10.1117/12.2239243
KEYWORDS: Lithography, Computational lithography, Photoresist processing, Data modeling, Calibration, Cadmium, 3D modeling, Computer simulations, Optical proximity correction, Semiconducting wafers
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