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Xinjun Li
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Publications (1)
Proceedings Article | 5 April 2012 Paper
Reticle intensity-based critical dimension uniformity to improve efficiency for DOMA correction in a foundry
Kin Wai Tang, Teng Hwee Ng, Lei Huang, Susan Ng, Thomas Ku, Wee Teck Chia, Lin Chua, William Li, Aaron Chin, Aditya Dayal, Tom Vavul, Trent Hutchinson
Proceedings Volume 8324, 83242W (2012) https://doi.org/10.1117/12.916335
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Inspection, Scanners, Yield improvement, Scanning electron microscopy, Information fusion, Calibration, Transistors
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