Xintuo Dai
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Process control, Metrology, Optical metrology, Defect inspection, Inspection, Semiconducting wafers, Critical dimension metrology, Finite element methods, Wafer-level optics, Line edge roughness, Lithography, Optics manufacturing

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Defect inspection, Metrology, Process control, Critical dimension metrology, Inspection, Optical lithography, Semiconducting wafers, Dimensional metrology, Overlay metrology, Manufacturing, Electron beam lithography, Image resolution, Scanning electron microscopy, Image processing

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Critical dimension metrology, Nanowires, Metrology, X-rays, Semiconductors, Logic, Overlay metrology, 3D metrology, Signal processing, Inspection, Signal to noise ratio, High volume manufacturing, Silicon, Scanning electron microscopy, Image resolution

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top