On the basis of theoretical analysis of biaxial birefringent thin films, this study investigates the optical
properties of phase shift on reflection and/or transmission through slanted columnar TiO2 sculptured
anisotropic thin film (ATF) deposited with glancing angle deposition (GLAD) technique via reactive
electron-beam evaporation. The tilted nanocolumn microstructures of thin film induce the optical
anisotropy. The optical constants dispersion equations of TiO2 ATF are determined from fitting the
transmittance spectra for s- and p-polarized waves measured at normal and oblique incidence within
400-1200nm. With the extracted structure parameters, the phase shifts of polarized light are analyzed
with the characteristic matrix and then measured with spectroscopic ellipsometry in the deposition
plane. A reasonably good agreement between the theoretical studies and experimental measurements is
obtained. In addition, the dependence of the phase shift on oblique incidence angle is also discussed.
The results show a greater generality and superiority of the characteristic matrix method. Birefringence
of the biaxial ATF performed a sophisticated phase modulation with varied incidence angles over a
broad range to have a wide-angle phase shift.
The development of 355 nm high reflection (HR) coatings with high laser-induced damage threshold (LIDT) is one of
the continuing challenges for the high power laser field. To increase the LIDT, many efforts have been done concerning
the coating material, coating design and deposition process. By optimization of the coating design and deposition
parameters, the 355 nm HR coating with LIDT higher than 18J/cm2 has been prepared. The development of the
measuring technique has promoted the investigation of laser damage precursors, enabling a better understanding of laser
damage mechanism.
AlF3 thin films were prepared by thermal evaporation at different substrate temperatures and deposition rates. The
relationships between optical properties, mechanical properties and laser-induced damage threshold (LIDT) at 355nm of
AlF3 films were discussed. Both absorption and stress increased with increasing substrate temperatures and deposition
rates, which was a disadvantage to laser-induced damage resistance. Meanwhile, interfacial adhesion and hardness
increased with substrate temperatures and deposition rates, which was an advantage to enhance the LIDT. The LIDT
increased from room temperature to 200°C duo to increasing interfacial adhesion and hardness, and then decreased to
300°C duo to increasing absorption and stress. The LIDT decreased with deposition rates due to increasing absorption
and stress.
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