Dr. Xuemei Chen
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Area of Expertise:
lithography , Metrology, Inspection , process modeling and control , yield , EUV , predictive analytics
Publications (18)

Proceedings Article | 24 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Actuators, Lithography, Optical lithography, Etching, Scanning electron microscopy, Process control, Plasma etching, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 24 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

SPIE Journal Paper | 17 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

Proceedings Article | 30 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Cadmium, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 27 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Showing 5 of 18 publications
Conference Committee Involvement (1)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
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