Dr. Xumou Xu
Member of Technical Staff at Applied Materials Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Finite element methods, Metals, Ultraviolet radiation, Back end of line

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Etching, Optical lithography, Oxides, Silicon, Lithography, Amorphous silicon, Image processing, Spatial frequencies, Electron beam lithography, Immersion lithography

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Etching, Double patterning technology, Oxides, Lithography, Photomasks, Optical lithography, Back end of line, 193nm lithography, Image processing, Front end of line

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Photomasks, Optical lithography, Oxides, Etching, Lithography, Silicon, Immersion lithography, Electron beam lithography, Line width roughness, Line edge roughness

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Line edge roughness, Photoresist processing, Semiconducting wafers, Optical lithography, Etching, Photomasks, Scanning electron microscopy, Chemical reactions, Lithography, Manufacturing

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top