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Yariv Simovitch
Research Scientist at Applied Materials Ltd
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Publications (1)
Proceedings Article | 24 May 2004 Paper
Usage of overlay metrology simulator in design of overlay metrology tools for the 65-nm node and beyond
Yariv Simovitch, Shahar Gov
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535400
KEYWORDS: Overlay metrology, Monochromatic aberrations, Semiconducting wafers, Silicon, Metrology, Point spread functions, Calibration, Oxides, Diffraction, Etching
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