Dr. Yashesh A. Shroff
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, X-ray optics, Sensors, Wavefront sensors, Wavefronts, Optical testing, Zernike polynomials, Photomasks, Artificial intelligence, Prototyping

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Optical lithography, Near field, Wave propagation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Near field optics, Tin

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, X-ray optics, Sensors, Interferometry, Wavefront sensors, Wavefronts, Optical testing, Zernike polynomials, Photomasks, Condition numbers

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Logic, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Electronic design automation, Model-based design

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical lithography, Etching, Image resolution, Printing, Photomasks, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 13 publications
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