Yasuhiro Ohmura
General Manager at Nikon Corp
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Mirrors, Optical lithography, Wavefronts, Control systems, Deformable mirrors, Distortion, Projection systems, Performance modeling, Overlay metrology

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Light sources, Optical lithography, Atrial fibrillation, Lithographic illumination, Scanners, Manufacturing, Wavefronts, Control systems, Distortion, Signal processing, Immersion lithography, Optical alignment, Semiconducting wafers, Yield improvement

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Sensors, Scanners, Manufacturing, Distortion, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Switching, Imaging systems, Water, Deformable mirrors, Distortion, Immersion lithography, Lithographic lenses, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Point spread functions, Modulation, Imaging systems, Scanners, Distortion, Photomasks, Source mask optimization, Semiconducting wafers, Fiber optic illuminators

Showing 5 of 24 publications
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