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Yasuhisa Sone
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Publications (3)
Proceedings Article | 14 May 2004 Paper
Impact of BARC on SEM shrinkage of ArF resist
Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884
KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness
Proceedings Article | 24 August 2001 Paper
Development of full-fill bottom antireflective coatings for dual-damascene process
Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917
KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet
Proceedings Article | 29 June 1998 Paper
Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate
Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412
KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings
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