CONFERENCE PROCEEDINGS
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Yasuko Tabata
at Tower Partners Semiconductor Co Ltd
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Publications (4)
Proceedings Article | 23 March 2011 Paper
Mask enhancer technology with source mask optimization (SMO) for 2Xnm-node logic layout gate fabrication
Takashi Matsuda, Shigeo Irie, Tadami Shimizu, Takashi Yuito, Yasuko Tabata, Yuuji Nonami, Akio Misaka, Taichi Koizumi, Masaru Sasago
Proceedings Volume 7973, 797316 (2011) https://doi.org/10.1117/12.878727
KEYWORDS: Photomasks, Source mask optimization, Binary data, Halftones, Logic devices, Lithographic illumination, Phase shifts, Resolution enhancement technologies, Logic, Optical proximity correction
Proceedings Article | 5 July 2000 Paper
130-nm KrF lithography for DRAM production with 0.68-NA scanner
Eiichi Kawamura, Kouichi Nagai, Hideyuki Kanemitsu, Yasuko Tabata, Soichi Inoue
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389088
KEYWORDS: Photomasks, Lithography, Scanners, Molybdenum, Optical lithography, Line edge roughness, Optical proximity correction, Critical dimension metrology, Photoresist processing, Lithographic illumination
Proceedings Article | 7 June 1996 Paper
Implementation of attenuated PSMs in DRAM production
Tatsuo Chijimatsu, Toru Higashi, Yasuko Tabata, Naoyuki Ishiwata, Satoru Asai, Isamu Hanyu
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240918
KEYWORDS: Chromium, Reticles, Photomasks, Opacity, Optical alignment, Mask making, Reflectivity, Printing, Semiconducting wafers, Quartz
Proceedings Article | 1 July 1991 Paper
Phase-shifting photolithography applicable to real IC patterns
Yuichiro Yanagishita, Naoyuki Ishiwata, Yasuko Tabata, Kenji Nakagawa, Kazumasa Shigematsu
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44783
KEYWORDS: Phase shifts, Photomasks, Medium wave, Optical lithography, Image enhancement, Mask making, Opacity, Etching, Chromium, Image contrast enhancement
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