Mr. Yasushi Nishiyama Profile

Yasushi Nishiyama

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Author

Publications (22)

Proceedings Article | 28 July 2014 Paper

Simulation of image placement error due to fabrication of black border on EUV mask

Yasushi Nishiyama, Shinpei Kondo, Norihito Fukugami

Proceedings Volume 9256, 92560S (2014) https://doi.org/10.1117/12.2067965

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet, Etching, Finite element methods, Reflectivity, Device simulation, Distortion, Glasses, EUV optics

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Proceedings Article | 30 June 2012 Paper

CD-Metrology of EUV masks in the presence of charging: measurement and simulation

Sergey Babin, Sergey Borisov, Hidemitsu Hakii, Yasushi Nishiyama, Isao Yonekura

Proceedings Volume 8441, 844108 (2012) https://doi.org/10.1117/12.999462

KEYWORDS: Monte Carlo methods, Extreme ultraviolet, Scanning electron microscopy, Photomasks, Sensors, Metrology, Oxides, Signal detection, Multilayers, Electron beams

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Proceedings Article | 14 October 2011 Paper

Addressing 3D metrology challenges by using a multiple detector CDSEM

Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto

Proceedings Volume 8166, 81661R (2011) https://doi.org/10.1117/12.896982

KEYWORDS: Sensors, Signal detection, 3D metrology, Photomasks, Atomic force microscopy, Lithography, Scanning electron microscopy, Image sensors, Edge detection, Extreme ultraviolet

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Proceedings Article | 19 May 2011 Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 7971, 79710C (2011) https://doi.org/10.1117/12.878728

KEYWORDS: Electrons, Extreme ultraviolet, Silica, Monte Carlo methods, Photomasks, Tantalum, Scanning electron microscopy, Critical dimension metrology, Multilayers, Scattering

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Proceedings Article | 20 April 2011 Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

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Proceedings Article | 11 May 2009 Paper

FIB mask repair technology for EUV mask

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri

Proceedings Volume 7379, 73792L (2009) https://doi.org/10.1117/12.824335

KEYWORDS: Photomasks, Carbon, Etching, Extreme ultraviolet, Hydrogen, Chemical vapor deposition, Contamination, Cadmium sulfide, Extreme ultraviolet lithography, Scanning electron microscopy

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Proceedings Article | 17 October 2008 Paper

Ga implantation and interlayer mixing during FIB repair of EUV mask defects

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Fumio Aramaki, Kensuke Shiina, Anto Yasaka, Ryoji Hagiwara

Proceedings Volume 7122, 71222J (2008) https://doi.org/10.1117/12.801428

KEYWORDS: Gallium, Reflectivity, Etching, Chromium, Silicon, Extreme ultraviolet, Chemical species, Ions, Absorption, Molybdenum

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Proceedings Article | 17 October 2008 Paper

The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Tsuneo Terasawa, Yukiyasu Arisawa, Hideaki Hashimoto, Norio Kameya, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano, Masatoshi Hirono

Proceedings Volume 7122, 71222F (2008) https://doi.org/10.1117/12.801550

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Reflectivity, Defect inspection, Opacity, Scanning electron microscopy, Defect detection, Optical inspection, Finite-difference time-domain method

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Proceedings Article | 17 October 2008 Paper

Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, Anto Yasaka

Proceedings Volume 7122, 71222H (2008) https://doi.org/10.1117/12.801214

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Bridges, Scanning electron microscopy, Image processing, Extreme ultraviolet, Semiconducting wafers, Chromium, Reflectivity

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Proceedings Article | 19 May 2008 Paper

Damage analysis of EUV mask under Ga focused ion beam irradiation

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Syuichi Kikuchi, Kensuke Shiina, Anto Yasaka, Ryoji Hagiwara

Proceedings Volume 7028, 70280J (2008) https://doi.org/10.1117/12.793026

KEYWORDS: Gallium, Reflectivity, Extreme ultraviolet, Photomasks, Silicon, Ions, Chemical species, Absorption, Etching, Ion beams

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Proceedings Article | 19 May 2008 Paper

Evaluation of defect repair of EUVL mask pattern using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Ryoji Hagiwara, Kensuke Shiina, Shuichi Kikuchi, Anto Yasaka

Proceedings Volume 7028, 70281T (2008) https://doi.org/10.1117/12.793071

KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Image processing, Bridges, Reflectivity, Critical dimension metrology, Tantalum, Isotropic etching

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Proceedings Article | 21 March 2008 Paper

Experimental evaluation of out-of-plane distortion of electrostatically chucked EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Yasushi Nishiyama, Takashi Kamono, Naosuke Nishimura, Tadahiko Takikawa, Youichi Usui, Osamu Suga

Proceedings Volume 6921, 69213S (2008) https://doi.org/10.1117/12.771339

KEYWORDS: Reticles, Particles, Carbon, Extreme ultraviolet, Quartz, Distortion, Silicon carbide, Interferometers, Photovoltaics, Semiconducting wafers

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Proceedings Article | 20 March 2008 Paper

Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning

Yasushi Nishiyama, Toshihisa Anazawa, Hiroaki Oizumi, Iwao Nishiyama, Osamu Suga, Kazuki Abe, Satoru Kagata, Akira Izumi

Proceedings Volume 6921, 692116 (2008) https://doi.org/10.1117/12.771978

KEYWORDS: Carbon, Reflectivity, Photomasks, Multilayers, Extreme ultraviolet, Contamination, Lithography, Tantalum, Hydrogen, X-rays

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Proceedings Article | 30 October 2007 Paper

Repair specification study for half-pitch 32-nm patterns for EUVL

Hajime Aoyama, Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 6730, 67305L (2007) https://doi.org/10.1117/12.746586

KEYWORDS: Critical dimension metrology, Tantalum, Opacity, Extreme ultraviolet lithography, Photomasks, Refraction, Refractive index, Printing, Etching, Carbon

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Proceedings Article | 30 October 2007 Paper

Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Hideaki Hashimoto, Norio Kameya, Shingo Murakami, Nobutaka Kikuiri

Proceedings Volume 6730, 67305J (2007) https://doi.org/10.1117/12.746580

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Opacity, Optical inspection, Reflectivity, Image transmission, Defect inspection, Deep ultraviolet, Scanning electron microscopy

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Proceedings Article | 15 May 2007 Paper

Evaluation of defect inspection sensitivity using 199-nm inspection optics

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Hideaki Hashimoto, Shingo Murakami, Nobutaka Kikuiri

Proceedings Volume 6607, 66073F (2007) https://doi.org/10.1117/12.729034

KEYWORDS: Inspection, Opacity, Photomasks, Extreme ultraviolet lithography, Optical inspection, Defect inspection, Reflectivity, Scanning electron microscopy, Deep ultraviolet, Defect detection

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Proceedings Article | 15 May 2007 Paper

Thermal analysis of EUV mask under inspection laser beam irradiation

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 6607, 66073B (2007) https://doi.org/10.1117/12.729030

KEYWORDS: Silicon, Inspection, Multilayers, Molybdenum, Extreme ultraviolet, Reflectivity, Tantalum, Photomasks, Deep ultraviolet, Laser irradiation

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Proceedings Article | 20 October 2006 Paper

Evaluation of bi-layer TaSix absorber on buffer for EUV mask

Koichiro Kanayama, Shinpei Tamura, Yasushi Nishiyama, Masashi Kawashita, Tadashi Matsuo, Akira Tamura, Susumu Nagashige, Kenji Hiruma, Doohoon Goo, Iwao Nishiyama

Proceedings Volume 6349, 63493A (2006) https://doi.org/10.1117/12.686388

KEYWORDS: Extreme ultraviolet, Gallium, Printing, Photomasks, Atomic force microscopy, Reflectivity, Silicon, Etching, Transparency, Inspection

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Proceedings Article | 20 May 2006 Paper

Optimization of TaSix absorber stack for EUV mask

Shinpei Tamura, Koichiro Kanayama, Yasushi Nishiyama, Tadashi Matsuo, Akira Tamura

Proceedings Volume 6283, 62830J (2006) https://doi.org/10.1117/12.681842

KEYWORDS: Extreme ultraviolet, Silicon, Reflectivity, Radium, Inspection, Tantalum, Refractive index, Photomasks, Optical properties, Etching

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Proceedings Article | 20 August 2004 Paper

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

Kazumasa Takeshi, Naoko Ito, Daisuke Inokuchi, Yasushi Nishiyama, Yuichi Fukushima, Yasuhiro Okumoto

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557692

KEYWORDS: Polymers, Chromium, Lithography, Photomasks, Chemical analysis, Chemically amplified resists, Mask making, Critical dimension metrology, Optical lithography, Semiconductors

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Showing 5 of 22 publications

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