Yasushi Nishiyama
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Multilayers, Etching, Glasses, Reflectivity, Distortion, Finite element methods, Photomasks, Extreme ultraviolet, Device simulation, EUV optics

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Oxides, Multilayers, Electron beams, Metrology, Sensors, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Signal detection

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Edge detection, Sensors, Atomic force microscopy, Scanning electron microscopy, Image sensors, 3D metrology, Photomasks, Extreme ultraviolet, Signal detection

Proceedings Article | 19 May 2011 Paper
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Metrology, Detection and tracking algorithms, Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Algorithm development, Signal detection, Polonium

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Sensors, Etching, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum, Signal detection

Showing 5 of 22 publications
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