Yasushi Sakaida
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Etching, Polymers, Resistance, Process control, Photomasks, Absorbance, Wet etching, Semiconductor manufacturing, Semiconducting wafers, Adhesives, Tin

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Etching, Polymers, Image processing, Materials processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Photoresist processing, Liquids

Proceedings Article | 31 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Silicon, Materials processing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Diffusion, Amplifiers, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Industrial chemicals

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Sensors, Etching, Glasses, Silicon, Coating, Materials processing, Double patterning technology, Semiconducting wafers

Showing 5 of 16 publications
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