Dr. Yasuyuki Unno
General Manager at Canon Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Diffraction, Error analysis, Distortion, Photomasks, High volume manufacturing, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Holograms, Optical lithography, Lithographic illumination, Diffractive optical elements, Polarization, Cameras, Computer generated holography, Projection systems, Calcite, Binary data

SPIE Journal Paper | 1 April 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance

SPIE Journal Paper | 1 April 2002
JM3 Vol. 1 Issue 01
KEYWORDS: Birefringence, Wavefronts, Polarization, Modulation transfer functions, Image acquisition, Projection systems, Optical lithography, Fluorine, Optical components, Coherence imaging

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Coherence imaging, Optical lithography, Polarization, Birefringence, Image acquisition, Wavefronts, Projection systems, Transmittance, Modulation transfer functions, Berkelium

Showing 5 of 6 publications
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