Dr. Yautzong Hsu Profile

Dr. Yautzong Hsu

Sr. Engineer/Inventor at Seagate Technology LLC

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Author

Publications (7)

Proceedings Article | 19 March 2015 Paper

Imprint directed self-assembly of cylinder-forming Si-containing block copolymer for 6nm half-pitch line patterning

Shuaigang Xiao, XiaoMin Yang, Yautzong Hsu, Kim Lee, David Kuo

Proceedings Volume 9423, 94230O (2015) https://doi.org/10.1117/12.2085986

KEYWORDS: Picosecond phenomena, Oxygen, Reactive ion etching, Optical lithography, Nanoimprint lithography, Etching, Plasma, Polymers, Plasma etching, Directed self assembly

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SPIE Journal Paper | 12 August 2014 Open Access

Fabrication of servo-integrated template for 1.5 Teradot/inch² bit patterned media with block copolymer directed assembly

XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, HongYing Wang, Justin Hwu, Philip Steiner, Koichi Wago, Kim Lee, David Kuo

JM3, Vol. 13, Issue 03, 031307, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031307

KEYWORDS: Servomechanisms, Beam propagation method, Scanning electron microscopy, Quartz, Magnetism, Nanoimprint lithography, Etching, Optical lithography, Lithography, Directed self assembly

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SPIE Journal Paper | 13 September 2012

Cleaning induced imprint template erosion

SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Tobias Wähler, Peter Dress

JM3, Vol. 11, Issue 3, 031407, (September 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031407

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Scanning electron microscopy, Silica, Inspection, Nanoimprint lithography, Hydrogen, Particles, Critical dimension metrology

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Proceedings Article | 21 March 2012 Paper

Controlling template erosion with advanced cleaning methods

SherJang Singh, Zhaoning Yu, Tobias Wähler, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Peter Dress

Proceedings Volume 8323, 832317 (2012) https://doi.org/10.1117/12.916294

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Silica, Scanning electron microscopy, Critical dimension metrology, Nanoimprint lithography, Particles, Inspection, Image analysis

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SPIE Journal Paper | 1 July 2004

Low-voltage electron beam lithography resist processes: top surface imaging and hydrogen silisesquioxane bilayer

Andrew Jamieson, C. Willson, Yautzong Hsu, Alan Brodie

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1758268

KEYWORDS: Line edge roughness, Electron beam lithography, Electron beams, Photoresist processing, Image processing, Imaging systems, Hydrogen, Etching, Polymers, Photomasks

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Proceedings Article | 24 July 2002 Paper

Hydrogen silsesquioxane bilayer resist process for low-voltage electron beam lithography

Andrew Jamieson, C. Grant Willson, Yautzong Hsu, Alan Brodie

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474194

KEYWORDS: Etching, Electron beams, Monte Carlo methods, Photoresist processing, Hydrogen, Imaging systems, Electron beam lithography, Photomasks, Oxygen, Reactive ion etching

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Proceedings Article | 23 June 2000 Paper

Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography

Evangelia Tegou, Evangelos Gogolides, Panagiotis Argitis, Ioannis Raptis, George Patsis, Nikos Glezos, Zoilo Tan, Kim Lee, Phuong Le, Yautzong Hsu, Michael Hatzakis

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388283

KEYWORDS: Electron beam lithography, Process modeling, Photoresist processing, Lithography, Diffusion

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Showing 5 of 7 publications

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