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Dr. Ye Chen
at Zhejiang Univ
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 12 March 2008 Paper
A new OPC method for double patterning technology
Proceedings Volume 6924, 692422 (2008) https://doi.org/10.1117/12.772345
KEYWORDS: Optical proximity correction, Double patterning technology, Model-based design, Photomasks, Logic, Critical dimension metrology, Optics manufacturing, Printing, Manufacturing, Very large scale integration
Proceedings Article | 27 November 2007 Paper
Advances in OPC technology and development of ZOPC tool
Xiaolang Yan, Zheng Shi, Ye Chen, Qijun Chen
Proceedings Volume 6827, 68271U (2007) https://doi.org/10.1117/12.760169
KEYWORDS: Optical proximity correction, Process modeling, Lithography, Photomasks, Resolution enhancement technologies, Computer simulations, 3D modeling, Data modeling, Semiconducting wafers, Model-based design
Proceedings Article | 12 May 2007 Paper
A specialized cell-wise OPC method for OPC-unfriendly spot detection
Proceedings Volume 6607, 66070O (2007) https://doi.org/10.1117/12.728938
KEYWORDS: Optical proximity correction, Model-based design, Convolution, Manufacturing, Lithography, Resolution enhancement technologies, Optics manufacturing, Calibration, Semiconducting wafers, Bridges
Proceedings Article | 27 March 2007 Paper
A feasible model-based OPC algorithm using Jacobian matrix of intensity distribution functions
Ye Chen, Kechih Wu, Zheng Shi, Xiaolang Yan
Proceedings Volume 6520, 65204C (2007) https://doi.org/10.1117/12.711763
KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Lithography, Optical lithography, Convolution, Semiconductors, Californium, Process modeling, Detection and tracking algorithms
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