Dr. Yeong-Uk Ko
Application Scientist
SPIE Involvement:
Author
Profile Summary

2007 to 2008
ReVera, Inc. (Semiconductor Tool Vendor) San Jose, CA
Senior Application Technologist
1) Tool development validation by interaction with engineering and research team (H/W, S/W)
2) Customer process support with thin film thickness, N dose, atomic composition and zMAX (centroid of N profile) film metrology and evaluation with XPS tool

2004 to 2006
Fab Solutions, Inc. (Semiconductor Tool Vendor) Tokyo, Japan
Research Scientist/Technical Marketing Staff

1999 to 2004
University of Tennessee, Electron Microscope Facility, Knoxville, TN
Sr. Research Scientist (with Prof. David Joy)

1988 to 1999
Korea Research Institute of Standards and Science, Daejon, Korea
Sr. Research Scientist, Project Manager
Publications (20)

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Interferometers, Etching, Copper, Optical testing, Scanning electron microscopy, Plating, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 6 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Sensors, Manufacturing, Resistance, Inspection, Capacitance, Signal processing, Measurement devices, Signal analyzers, Signal detection

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Oxides, Thin films, Scattering, Image processing, Dielectrics, Electrons, Interfaces, Monte Carlo methods, Device simulation

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electron beams, Silica, Imaging systems, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Selenium, Semiconducting wafers, Statistical modeling

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Thin films, Electron beams, Gaussian beams, Electrons, Diffusion, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects

Showing 5 of 20 publications
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