Mr. Yew-Kong Tan Profile

Yew-Kong Tan

Director at GLOBALFOUNDRIES Singapore

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 22 August 2001 Paper

Improvement in E2 nozzle performance: no imprint and less contamination

KianSiong Ang, Shu Low, AikChin Lim, CheeKeong Lim, LiahKee Loh, Yew-Kong Tan, Xu Yang

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436753

KEYWORDS: Contamination, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Metals, Photoresist materials, Industrial chemicals, Yield improvement, Semiconductor manufacturing, Lithography

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Proceedings Article | 22 August 2001 Paper

Evaluation of overlay performance by using air shower at the prealignment

Amit Ghosh, Yew-Kong Tan, D. Arunagiri Rajan, Gin Sun

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436733

KEYWORDS: Metrology, Inspection, Process control, Optical lithography, Quantum wells, Front end of line, Back end of line

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Proceedings Article | 22 August 2001 Paper

W-CMP alignment using ASML's ATHENA system on an I-line stepper

K. Prasad, D. Arunagiri Rajan, Yew-Kong Tan, Gin Sun, Stephen Morgan, Merritt Phillips, Bruce Ng

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436730

KEYWORDS: Semiconducting wafers, Optical alignment, Overlay metrology, Metals, Avalanche photodetectors, Diffraction, Yield improvement, Chemical mechanical planarization, Data transmission, Photomasks

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Proceedings Article | 22 August 2001 Paper

Wafer edge dies yield improvements

Kia Huat Gan, Yew-Kong Tan, Gin Sun

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436752

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Yield improvement, Chemical mechanical planarization, Metrology, Inspection, Process control, Optical lithography, Glasses, Coating

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