Mr. Yi-Ciang Jhang Profile

Yi-Ciang Jhang

Masters Student at National Taipei Univ of Technology

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Proceedings Article | 30 August 2017 Presentation + Paper

High efficient light absorption and nanostructure-dependent birefringence of a metal-dielectric symmetrical layered structure

Yi-Jun Jen, Yi-Ciang Jhang, Wei-Chih Liu

Proceedings Volume 10356, 1035604 (2017) https://doi.org/10.1117/12.2273927

KEYWORDS: Refractive index, Birefringence, Dielectrics, Thin films, Absorption, Metamaterials, Multilayers, Metals, Amorphous silicon, Nanostructures

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A multilayer that comprises ultra-thin metal and dielectric films has been investigated and applied as a layered metamaterial. By arranging metal and dielectric films alternatively and symmetrically, the equivalent admittance and refractive index can be tailored separately. The tailored admittance and refractive index enable us to design optical filters with more flexibility. The admittance matching is achieved via the admittance tracing in the normalized admittance diagram. In this work, an ultra-thin light absorber is designed as a multilayer composed of one or several cells. Each cell is a seven-layered film stack here. The design concept is to have the extinction as large as possible under the condition of admittance matching. For a seven-layered symmetrical film stack arranged as Ta₂O₅ (45 nm)/ a-Si (17 nm)/ Cr (30 nm)/ Al (30 nm)/ Cr (30 nm)/ a-Si (17 nm)/ Ta₂O₅ (45 nm), its mean equivalent admittance and extinction coefficient over the visible regime is 1.4+0.2i and 2.15, respectively. The unit cell on a transparent BK7 glass substrate absorbs 99% of normally incident light energy for the incident medium is glass. On the other hand, a transmission-induced metal-dielectric film stack is investigated by using the admittance matching method. The equivalent anisotropic property of the metal-dielectric multilayer varied with wavelength and nanostructure are investigated here.

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