CONFERENCE PROCEEDINGS
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Dr. Yi-Yien Tsai
at DelSolar Co Ltd
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 28 April 2023 Poster + Paper
Lithography hotspot correction on post-OPC layout using generative adversarial networks
Weilun Ciou, Tony Hu, Fz Cheng, Y. Tsai, Terry Hsuan, Elvis Yang, T. Yang, K. Chen
Proceedings Volume 12495, 124951Y (2023) https://doi.org/10.1117/12.2654456
KEYWORDS: Machine learning, Data modeling, Contour modeling, Optical proximity correction, Lithography, Critical dimension metrology, Image segmentation, Deep learning
SPIE Journal Paper | 23 November 2022
Machine learning optical proximity correction with generative adversarial networks
Weilun Ciou, Tony Hu, Yi-Yen Tsai, Chung-Te Hsuan, Elvis Yang, Ta-Hung Yang, Kuang-Chao Chen
JM3, Vol. 21, Issue 04, 041606, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041606
KEYWORDS: Photomasks, Education and training, Optical proximity correction, Data modeling, Networks, Gallium nitride, Machine learning, Computer simulations, Semiconducting wafers, Image processing
Proceedings Article | 26 May 2022 Presentation + Paper
Machine learning OPC with generative adversarial networks
Weilun Ciou, Tony Hu, Yi-Yien Tsai, Chung-Te Hsuan, Elvis Yang, Ta-Hung Yang, Kuang-Chao Chen
Proceedings Volume 12052, 120520Z (2022) https://doi.org/10.1117/12.2606715
KEYWORDS: Data modeling, Photomasks, Optical proximity correction, Machine learning, Performance modeling, Computer simulations, Detection and tracking algorithms, Computer programming
Proceedings Article | 22 February 2021 Presentation + Paper
SRAF placement with generative adversarial network
Weilun Ciou, Tony Hu, Y. Tsai, Terry Hsuan, Elvis Yang, T. Yang, K. Chen
Proceedings Volume 11613, 1161305 (2021) https://doi.org/10.1117/12.2581334
KEYWORDS: SRAF, Source mask optimization, Resolution enhancement technologies, Manufacturing, Lithography, 3D modeling, Printing, Photomasks, Molybdenum, Model-based design
Proceedings Article | 16 March 2009 Paper
Image-assistant OPC model calibration on 65nm node contact layer
Y. Y. Tsai, S. L. Tsai, Fred Lo, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu
Proceedings Volume 7274, 727426 (2009) https://doi.org/10.1117/12.813461
KEYWORDS: Calibration, Data modeling, Scanning electron microscopy, Optical proximity correction, Image processing, Feature extraction, Error analysis, Wafer testing, Process modeling, Photomasks
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