Mr. Yigwon Kim Profile

Yigwon Kim

at SAMSUNG Electronics Co., Ltd.

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 16 April 2024 Presentation + Paper

SEM overlay target design optimization by e-beam simulation

Il Hwan Kim, Cheolgyu Hyun, Sangho Jo, Muyoung Lee, Ikjun Jang, Jongsu Kim, Jinhong Park, Yigwon Kim, Chang Min Park, Kevin Houchens, Jenny Perry, Nahum Bomshtein, Liad Anokov, Noam Oved, Uri Smolyan, Michael Shifrin, Tal Itzkovich, Jeong Ho Yeo, You Jin Kim, Baek Jun Kim

Proceedings Volume 12955, 129551I (2024) https://doi.org/10.1117/12.3010511

KEYWORDS: Design, Scanning electron microscopy, Overlay metrology, Monte Carlo methods, Electrons, Lithography, Precision measurement, Electron beam lithography, Design rules, Signal detection

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Proceedings Article | 28 April 2023 Presentation + Paper

An investigation on the process control for the solid application of EUV MOR

Sangjin Kim, Il-Hwan Kim, Hyungju Ryu, Yongbeom Seo, Yigwon Kim, Jinhee Jang, Tae-Min Choi, Sol Jeong, Yongchul Jeong, Kyoungyong Cho, Cheolin Jang, Kyeongbeom Park, Changmin Park

Proceedings Volume 12494, 124940V (2023) https://doi.org/10.1117/12.2658345

KEYWORDS: Etching, Extreme ultraviolet lithography, Metal oxides, Coating, Chemical reactions, Process control, Extreme ultraviolet

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Proceedings Article | 28 April 2023 Presentation + Paper

Chemical approach to make the most of EUVL: stochastic effect mitigation with developer and rinse

Hyungju Ryu, Dokyeong Kwon, Jiho Song, Wongi Park, Jinseong Gwak, Haram Ko, Jiyoung Lee, Jinpyoung Kim, Kyungseok Ryu, Sungjo Hwang, Taemin Jeong, Heeyoung Go, Yigwon Kim, Kyoungyong Cho, Sangjin Kim, Changmin Park

Proceedings Volume 12494, 1249404 (2023) https://doi.org/10.1117/12.2656415

KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Lithography, Optical lithography, Photoresist processing, EUV optics, Chemical composition, Semiconductors

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