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YoHan Ahn
at Samsung Electronics Co Ltd
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Author
Publications (2)
Proceedings Article | 30 October 2007 Paper
Effects of exposure environment on pellicle degradation in ArF lithography
Hyungseok Choi, Yohan Ahn, Jeongin Yoon, Yangkoo Lee, Yongjhin Cho, Jongann Kim
Proceedings Volume 6730, 67300B (2007) https://doi.org/10.1117/12.746857
KEYWORDS: Pellicles, Reticles, Nitrogen, Lithography, Laser bonding, Oxygen, Laser energy, Photomasks, Laser scanners, 3D scanning
Proceedings Article | 5 April 2007 Paper
ArF pellicle degradation mechanism for resolving CD variation
Hyungseok Choi, Yohan Ahn, Jua Ryu, Yangkoo Lee, Bumhyun An, Seokryeol Lee
Proceedings Volume 6518, 65184Z (2007) https://doi.org/10.1117/12.718338
KEYWORDS: Pellicles, Critical dimension metrology, Reticles, Transmittance, Photomasks, Semiconducting wafers, Lithography, Binary data, Air contamination, Laser energy
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