Dr. Yohannes M. Desta Profile

Dr. Yohannes M. Desta

Research Associate at IntelliSense Software Corp

SPIE Involvement:

Author

Publications (15)

SPIE Journal Paper | 1 July 2004

High-resolution x-ray masks for high aspect ratio microelectromechanical systems applications

Lin Wang, Todd Christenson, Yohannes Desta, Rainer Fettig, Jost Goettert

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1753271

KEYWORDS: Photomasks, X-rays, Gold, Silicon, X-ray lithography, Electron beam lithography, Etching, Photoresist processing, Electroplating, Anisotropic etching

Read Abstract +

Proceedings Article | 30 December 2003 Paper

Fabrication of large-area x-rays masks for UDXRL on beryllium using thin film UV lithography and x-ray backside exposure

Josef Kouba, Zhong-Geng Ling, Lin Wang, Yohannes Desta, Jost Goettert

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.531598

KEYWORDS: Gold, X-rays, Photomasks, X-ray lithography, Beryllium, Plating, Ultraviolet radiation, Lithography, Photoresist materials, Photoresist processing

Read Abstract +

Proceedings Article | 16 June 2003 Paper

High-resolution x-ray masks for the application of high-aspect-ratio microelectromechanical systems (HARMS)

Lin Wang, Yohannes Desta, Jost Goettert, F. Xian

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504555

KEYWORDS: X-rays, Photomasks, X-ray lithography, Silicon, Electron beam lithography, Gold, Mask making, Polymethylmethacrylate, Plating, Etching

Read Abstract +

Proceedings Article | 24 April 2003 Paper

Cost-effective masks for deep x-ray lithography

Heinz-Ulrich Scheunemann, Bernd Loechel, Linke Jian, Daniel Schondelmaier, Yohannes Desta, Jost Goettert

Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.498986

KEYWORDS: Photomasks, X-rays, X-ray lithography, Carbon, Silicon carbide, Beryllium, Transparency, Silicon, Polishing, Glasses

Read Abstract +

Proceedings Article | 17 January 2003 Paper

Molded multilevel modular microfluidic devices

Flavio Aristone, Proyag Datta, Yohannes Desta, Alexey Espindola, Jost Goettert

Proceedings Volume 4982, (2003) https://doi.org/10.1117/12.472890

KEYWORDS: Liquids, Nickel, Electroplating, Polymethylmethacrylate, Microfluidics, Photomasks, Plating, Optical alignment, X-rays, Biological research

Read Abstract +

Proceedings Article | 15 January 2003 Paper

High-resolution x-ray masks for high-aspect-ratio microelectromechanical systems (HARMS)

Lin Wang, Flavio Aristone, Jost Goettert, Jong Ren Kong, Keith Bradshaw, Todd Christenson, Yohannes Desta, Yoonyoung Jin

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478268

KEYWORDS: Photomasks, X-rays, Gold, X-ray lithography, Plating, Silicon, Polymethylmethacrylate, Electroplating, Electron beam lithography, Mirrors

Read Abstract +

Proceedings Article | 15 January 2003 Paper

High-aspect-ratio microstructures for magnetoelectronic applications

Tao Wang, Andrew McCandless, Sean Ford, Kevin Kelly, Richard Lienau, Dale Hensley, Yohannes Desta, Zhong-geng Ling

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.472792

KEYWORDS: X-rays, Gold, Photomasks, Etching, Semiconducting wafers, Polymethylmethacrylate, Silicon, X-ray lithography, Plating, Ultraviolet radiation

Read Abstract +

Proceedings Article | 15 January 2003 Paper

SU-8-based deep x-ray lithography/LIGA

Linke Jian, Yohannes Desta, Jost Goettert, Martin Bednarzik, Bernd Loechel, Yoonyoung Jin, Georg Aigeldinger, Varshni Singh, Gisela Ahrens, Gabi Gruetzner, Ralf Ruhmann, Reinhard Degen

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478246

KEYWORDS: X-ray lithography, X-rays, Polymethylmethacrylate, Ultraviolet radiation, Lithography, Microelectromechanical systems, Photoresist processing, Nickel, 3D microstructuring, Electroplating

Read Abstract +

Proceedings Article | 15 January 2003 Paper

Borosilicate-glass-based x-ray masks for LIGA microfabrication

Yohannes Desta, Martin Bednarzik, Michael Bryant, Jost Goettert, Linke Jian, Yoonyoung Jin, Daejong Kim, Sanghoon Lee, Bernd Loechel, Hans-Ulrich Scheunemann, Zhengchun Peng

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478258

KEYWORDS: Photomasks, X-rays, Glasses, Gold, Polymethylmethacrylate, Borosilicate glass, X-ray lithography, Surface roughness, Lithography, Electroplating

Read Abstract +

Proceedings Article | 28 September 2001 Paper

Multilevel microstructures and mold inserts fabricated with planar and oblique x-ray lithography of SU-8 negative photoresist

Linke Jian, Yohannes Desta, Jost Goettert

Proceedings Volume 4557, (2001) https://doi.org/10.1117/12.442979

KEYWORDS: X-ray lithography, X-rays, Nickel, Photomasks, Electroplating, Ultraviolet radiation, Optical lithography, Lithography, Polymethylmethacrylate, Photoresist materials

Read Abstract +

Proceedings Article | 28 September 2001 Paper

Stacked ultradeep x-ray lithography exposures: preliminary results

Georg Aigeldinger, Yohannes Desta, Jost Goettert, Franz Pantenburg

Proceedings Volume 4557, (2001) https://doi.org/10.1117/12.442985

KEYWORDS: Polymethylmethacrylate, X-ray lithography, Scanners, Photomasks, Beryllium, X-rays, Optical lithography, Scanning electron microscopy, Temperature metrology, Surface roughness

Read Abstract +

Proceedings Article | 11 August 2000 Paper

Fabrication of graphite masks for deep and ultradeep x-ray lithography

Yohannes Desta, Georg Aigeldinger, Kevin Zanca, Philip Coane, Jost Goettert, Michael Murphy

Proceedings Volume 4175, (2000) https://doi.org/10.1117/12.395599

KEYWORDS: Photomasks, X-rays, Gold, X-ray lithography, Polymethylmethacrylate, Optical lithography, Silicon, Photoresist processing, Titanium, Nickel

Read Abstract +

Proceedings Article | 23 September 1996 Paper

Fabrication of LIGA mold inserts using a modified procedure

Vikas Galhotra, Christophe Marques, Yohannes Desta, Kevin Kelly, Mircea Despa, Ajit Pendse, John Collier

Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251204

KEYWORDS: Polymethylmethacrylate, Nickel, Electroplating, X-ray lithography, Polymers, Lithography, Photomasks, Electrodes, Chemical engineering, Manufacturing

Read Abstract +