Mr. Yonghee Park Profile

Yonghee Park

Assistant Engineer at Samsung Electronics Co Ltd

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Publications (4)

Proceedings Article | 28 April 2023 Presentation + Paper

Next-generation logic design architecture for vertical-transport nanosheets

B. Senapati, J. Do, A. Young, D. Dechene, S, Song, Y. Park, J. Kong, N. Lanzillo, C. Zhang, S. Fan, S. Baek, S. Mukesh, H. Jagannathan, B. Anderson, T. Wu, D. Guo, K.-I. Seo, H. Bu

Proceedings Volume 12495, 124950L (2023) https://doi.org/10.1117/12.2658187

KEYWORDS: Nanosheets, Logic, Design and modelling, Fin field effect transistors, Field effect transistors, Transistors, Optical lithography, Industry, Metals, Double patterning technology

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Proceedings Article | 13 March 2009 Paper

Score-based fixing guidance generation with accurate hot-spot detection method

Yong-Hee Park, Dong-Hyun Kim, Jung-Hoe Choi, Ji-Suk Hong, Chul-Hong Park, Sang-Hoon Lee, Moon-Hyun Yoo, Jun-Dong Cho

Proceedings Volume 7275, 72750P (2009) https://doi.org/10.1117/12.811840

KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Calibration, Optical lithography, Nanoimprint lithography, Image quality, Photomasks, Semiconductors, Image enhancement

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Proceedings Article | 20 March 2006 Paper

Efficient OPC model generation and verification for focus variation

Yong-Hee Park, Yong-Chan Ban, Duck-Hyung Hur, Dong-Hyun Kim, Ji-Suk Hong, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 6154, 61543B (2006) https://doi.org/10.1117/12.656762

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Lithography, Photomasks, Semiconducting wafers, Optical lithography, Instrument modeling, Critical dimension metrology, Algorithms

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Proceedings Article | 17 December 2003 Paper

Efficient mask data preparation for variable shaped e-beam writing system focusing on memory devices

Tae Jang, Jong-Bae Lee, Jae-Pil Shin, Kwang-Jai Yoo, Dai-Hyun Jung, Yong-Hee Park, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517828

KEYWORDS: Data conversion, Data processing, Vestigial sideband modulation, Computer aided design, Critical dimension metrology, Mask making, Resolution enhancement technologies, Control systems, Raster graphics, Manufacturing

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