The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. An arrayed microcolumn test-bed system has been developed for high throughput applications. The arrayed microcolumns based on of Single Column Module (SCM), and Wafer-Scale Column Module (WCM) concepts have been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 100 eV to 1 keV for the generation of nano patterns. Probe beam current at the sample was measured about 2 nA at a total beam current of ~0.4 mA. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.
To develop the head mounted visual enhancement device (HMVED), we have suggested five methods for visual acuity enhancement such as image magnification, effects of viewing axis control, wavelength control of light source, and effects of power control of light source and focal length control. In addition, the mobility and convenience of the HMVED should be considered. The HMVED consists of a 0.44" high quality TFT Color LCD (active dots: 800(H)×225(V)), a magnifier lens, a TFT color LCD back light, a prism and a diopter lens. The LCD is used to display the magnified image by a magnifying lens. The backlight can be controlled by the intensity and color light source. The prism can refract the viewing axis. The basic clinical experiments of the HMVED have been performed at Low Vision Device Company in Korea. The results show beneficiary effects on people with low vision.