Yong-Jun Choi
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Semiconductors, Optical lithography, Polymers, Molecules, Interfaces, Diffusion, Photoresist materials, Line edge roughness, Photoresist processing, Photoresist developing

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Polymers, Water, Silicon, Photoresist materials, Photoresist processing, Semiconducting wafers, Polymer thin films, Photorefractive polymers, 193nm lithography

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Polymers, Molecules, Silicon, Diffusion, Electroluminescence, Silicon films, Semiconducting wafers, Polymer thin films, Chemically amplified resists

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Contamination, Etching, Polymers, Ions, Hydrogen, Diffusion, Photoresist materials, Line edge roughness, Photoresist developing

Proceedings Article | 24 August 2001 Paper
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Oxides, Lithography, Monochromatic aberrations, Optical lithography, Etching, Polymers, Silicon, Scanning electron microscopy, Photomasks, Line edge roughness

Showing 5 of 8 publications
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