Ta2O5 thin films are widely used in optical and microelectronic industry because of its superior optical and mechanical properties. In this paper, single-layer Ta2O5 thin films were prepared by APS plasma assisted electron beam evaporation deposition. Based on the theory of ion energy transfer, the selection criteria of APS process parameters were established. By optimizing APS source parameters, Ta2O5 thin films with different characteristics were prepared. The spectral and refractive index dispersion of Ta2O5 thin films were analyzed by Cary7000 spectrophotometer. The stress and surface roughness of Ta2O5 films were analyzed by Zygo interferometer. Experiment and analysis results showed that the characteristics of Ta2O5 thin films are closely related to APS plasma assisted processing parameters. The discharge current and bias voltage of APS source have great influence on the stress and surface roughness of Ta2O5 thin films, but have little influence on the spectral characteristics and refractive index dispersion. The influences of preparation parameters on the properties of Ta2O5 thin films were analyzed and optimization fabrication parameters were obtained.
HfO2 thin films are widely used in laser system because of its superior optical and mechanical properties, especially high laser induced damage threshold. In this paper, single-layer HfO2 thin films were prepared by APS plasma assisted electron beam evaporation deposition. The effects of oxygen charging of electron gun, baking temperature, discharge current of APS source and bias voltage of APS source on optical properties, surface roughness, standing wave electric filed and laser induced damage threshold of HfO2 thin films were studied by orthogonal experiment. Experiment and analysis results showed that the characteristics of HfO2 thin films are closely related to the oxygen charging of electron gun, baking temperature and APS assisted processing parameters. Especially, baking temperature, oxygen charging of electron gun and bias voltage of APS source have great influence on laser induced damage threshold. Through the analysis of experimental date, the optimal combination of process parameters for APS assisted electron beam evaporation of HfO2 optical films were obtained.
BaTiO3 film is deposited on single crystal MgO substrate with pulsed laser deposition, and its crystal structure and surface roughness are characterized by X-ray diffraction instrument and atomic force microscope. BaTiO3 film crystal quality is analyzed under three different oxygen partial pressure and three different annealing temperatures. The result shows that when the oxygen partial pressure is 15Pa, crystal surface (001) and (002) diffraction peak of BaTiO3 thin films have higher intensity. It indicated that the film has a good c-axis orientation. When the annealing temperature is 800°C, the intensity of diffraction peak is the maximum, and peak shape is sharper. BaTiO3 crystal film is obtained with highly preferred orientation, and film density is improved. Thus the film has less surface roughness and good crystalline state.
With the rapid development of optical testing technology, laser heterodyne interferometer has been used more and more widely. As the testing precision requirements continue to increase, the technical prism is an important component of heterodyne interference. The research utilizing thin film technology to improve optical performance of interferometer has been a new focus. In the article, based on the use requirements of interferometer beam splitting prism, select Ta2O5 and SiO2 as high and low refractive index materials respectively, deposit on substrate K9. With the help of TFCalc design software and Needle method, adopting electron gun evaporation and ion assisted deposition, the beam splitting prism is prepared successfully and the ratio of transmittance and reflectance for this beam splitting prism in 500~850 nm band, incident angle 45 degree is 8:2. After repeated tests, solved the difference problem of film deposition process parameters ,controlled thickness monitoring precision effectively and finally prepared the ideal beam splitting prism which is high adhesion and stable optics properties. The film the laser induced damage threshold and it meet the requirements of heterodyne interferometer for use.
Through the method of nonlinear optical frequency conversion method, 532nm, 355nm and 266nm laser wavelength can be attained by YAG1064nm laser. Mirror that works in this system must satisfy the requirements of high reflection in four bands. Based on the film design system to choose appropriate coating materials, adopting electron beam vacuum ion assisted deposition technique, through optimizing the parameters of the process, the film that reflectance is 99.8% at 1064nm , 99.6% at 532nm ,97.9% at 355nm and 96.8% at 266nm is prepared on the substrate of JGS1. Additionally, the laser induce damage threshold in the ultraviolet wave band is 1.432J/cm2 at 355nm , 0.923J/cm2 at 266nm. The results show that all the preparation of mirror meets the requirements well.
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