Yongdae Kim
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Defect detection, Light scattering, Inspection, Surface roughness, CCD cameras, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Prototyping

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Erbium, Extreme ultraviolet lithography, Phase measurement, Semiconducting wafers

Proceedings Article | 6 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Optical lithography, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Silicon, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Ruthenium

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Contamination, Air contamination, Inspection, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Fluorine, Semiconducting wafers

Showing 5 of 20 publications
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