Dr. Yongdong Liu Profile

Dr. Yongdong Liu

at Onto Innovation Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 May 2013 Paper

Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

Hock-Chun Chin, Bin Liu, Xingui Zhang, Moh-Lung Ling, Chan-Hoe Yip, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8788, 87881R (2013) https://doi.org/10.1117/12.2020248

KEYWORDS: Scatterometry, Metrology, Germanium, Transistors, Molybdenum, Process control, Indium gallium arsenide, Spectroscopy, Scanning electron microscopy

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Proceedings Article | 10 April 2013 Paper

Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

Hock-Chun Chin, Moh-Lung Ling, Bin Liu, Xingui Zhang, Jie Li, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8681, 86813D (2013) https://doi.org/10.1117/12.2013413

KEYWORDS: Germanium, Scatterometry, Transmission electron microscopy, Scanning electron microscopy, Transistors, Metrology, Etching, Front end of line, 3D modeling

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Proceedings Article | 5 April 2012 Paper

Faster diffraction-based overlay measurements with smaller targets using 3D gratings

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Catherine Volkman, Jiangtao Hu

Proceedings Volume 8324, 83241I (2012) https://doi.org/10.1117/12.916747

KEYWORDS: Semiconducting wafers, Overlay metrology, 3D acquisition, 3D metrology, Finite element methods, Diffraction gratings, Time metrology, Spectroscopy, Reflectance spectroscopy, 3D modeling

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Proceedings Article | 20 April 2011 Paper

Advancements of diffraction-based overlay metrology for double patterning

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Ulrich Weher, Catherine Volkman, Martin Mazur, Jiangtao Hu

Proceedings Volume 7971, 79711Y (2011) https://doi.org/10.1117/12.879552

KEYWORDS: Overlay metrology, Double patterning technology, Reflectance spectroscopy, Detection and tracking algorithms, Time metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Spectroscopy, Reflectometry

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SPIE Journal Paper | 1 October 2010

Mueller matrix measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

JM3, Vol. 9, Issue 04, 041305, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514708

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

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Proceedings Article | 2 April 2010 Paper

Advanced diffraction-based overlay for double patterning

Jie Li, Yongdong Liu, Prasad Dasari, Jiangtao Hu, Nigel Smith, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7638, 76382C (2010) https://doi.org/10.1117/12.848516

KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

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Proceedings Article | 11 December 2009 Paper

Optical critical dimension measurements for patterned media with 10's nm feature size

Yongdong Liu, Milad Tabet, Jiangtao Hu, Zhaoning Yu, Justin Hwu, Wei Hu, Sha Zhu, Gene Gauzner, Kim Lee, Shifu Lee

Proceedings Volume 7520, 75200H (2009) https://doi.org/10.1117/12.839523

KEYWORDS: Quartz, Scanning electron microscopy, Metrology, Critical dimension metrology, Atomic force microscopy, Ultraviolet radiation, Nanoimprint lithography, Lithography, Optical testing, Scanning transmission electron microscopy

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Proceedings Article | 11 December 2009 Paper

Ultra-sensitive optical metrology for hard disk DTR and BPM imprints

Jeffrey Roberts, Linlin Hu, Iris Bloomer, Shih-Fu Lee, Yongdong Liu

Proceedings Volume 7520, 75200I (2009) https://doi.org/10.1117/12.837146

KEYWORDS: Beam propagation method, Critical dimension metrology, Reflectivity, Transmittance, Atomic force microscopy, Gemini Observatory, Silica, Metrology, Etching, Optical metrology

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Proceedings Article | 11 December 2009 Paper

Scatterometry measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

Proceedings Volume 7520, 75201B (2009) https://doi.org/10.1117/12.839821

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Lithography, Scatter measurement, Critical dimension metrology, Spectroscopic ellipsometry, Photoresist processing, Calibration, Metrology

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Proceedings Article | 1 April 2008 Paper

Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns

Oleg Kritsun, Bruno La Fontaine, Yongdong Liu, Chandra Saravanan

Proceedings Volume 6924, 69241M (2008) https://doi.org/10.1117/12.776783

KEYWORDS: Scatterometry, Double patterning technology, Optical proximity correction, 3D modeling, 3D metrology, Lithography, Critical dimension metrology, Scatter measurement, Overlay metrology, Metrology

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Proceedings Article | 22 March 2008 Paper

Evaluating diffraction based overlay metrology for double patterning technologies

Chandra Saru Saravanan, Yongdong Liu, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Alden Acheta, Bruno La Fontaine

Proceedings Volume 6922, 69220C (2008) https://doi.org/10.1117/12.774736

KEYWORDS: Overlay metrology, Double patterning technology, Silicon, Scatterometry, Optical lithography, Diffraction, Spectroscopy, Critical dimension metrology, Photoresist materials, Metrology

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Showing 5 of 11 publications

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