Dr. Yongfa Fan
Senior R&D Engineer at ASML Silicon Valley
SPIE Involvement:
Author
Publications (34)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Plasma etching, Optical proximity correction, Reactive ion etching, Plasma

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Computer simulations, 3D modeling, Computational lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Calibration, Etching, Diffusion, 3D modeling, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, 3D modeling, Photomasks, Optical proximity correction, Statistical modeling, Performance modeling, 3D image processing

Showing 5 of 34 publications
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