Mr. YongKyoo Choi Profile

YongKyoo Choi

Executive Manager

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 20 March 2009 Paper

Paper

Evaluation of shadowing and flare effect for EUV tool

James Moon, Cheol-Kyun Kim, Byoung-Sub Nam, Byoung-Ho Nam, Yoon-Suk Hyun, Suk-Kyun Kim, Chang-Moon Lim, Yong-Dae Kim, Mun-Sik Kim, Yong-Kyoo Choi, Chang-Reol Kim, Donggyu Yim

Proceedings Volume 7271, 727144 (2009) https://doi.org/10.1117/12.814364

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Photomasks, Scanning electron microscopy, Wafer testing, Silicon, Light scattering

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Proceedings Article | 17 October 2008 Paper

Paper

The study of CD behavior due to transmission control position change within photomask substrate

Munsik Kim, Hyemi Lee, Sungha Woo, Kangjoon Seo, Yongkyoo Choi, Changyeol Kim

Proceedings Volume 7122, 712239 (2008) https://doi.org/10.1117/12.801432

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Quartz, Control systems, Printing, Refractive index, Laser scattering, Optical lithography, Ultrafast lasers

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Proceedings Article | 19 May 2008 Paper

Paper

The study to optimize CD uniformity by reliable area CD measurement on 45nm D/R DRAM

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 7028, 70281O (2008) https://doi.org/10.1117/12.793065

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Transmittance, Spatial filters, Image filtering, Image enhancement, Image processing, Error analysis

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Proceedings Article | 19 May 2008 Paper

Paper

An explosive haze formation under low energy exposure

Junsik Lee, Yongdae Kim, Yongkyoo Choi, Changreol Kim

Proceedings Volume 7028, 70282B (2008) https://doi.org/10.1117/12.793085

KEYWORDS: Air contamination, Photomasks, Raman spectroscopy, Packaging, Explosives, Inspection, Reticles, Pellicles, Ultraviolet radiation, Organic materials

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Proceedings Article | 19 May 2008 Paper

Paper

The source of carbon contamination for EUV mask production

Yongdae Kim, Junsik Lee, Yongkyoo Choi, Changreol Kim

Proceedings Volume 7028, 70281U (2008) https://doi.org/10.1117/12.799668

KEYWORDS: Carbon, Photomasks, Extreme ultraviolet lithography, Contamination, Extreme ultraviolet, Reflectivity, Analytical research, Lithography, Raman spectroscopy, Scanning probe microscopy

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Proceedings Article | 2 May 2008 Paper

Paper

Design of pattern-specific mask grating for giving the effect of an off-axis illumination

Young-Seok Kim, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee, Seung Gol Lee

Proceedings Volume 6792, 67920R (2008) https://doi.org/10.1117/12.798809

KEYWORDS: Photomasks, Lithographic illumination, Optical design, Chromium, Lithography, Quartz, Atrial fibrillation

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Proceedings Article | 21 March 2008 Paper

Paper

EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 6921, 692123 (2008) https://doi.org/10.1117/12.773145

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Deep ultraviolet, Reflectivity, Defect inspection, Extreme ultraviolet lithography, EUV optics, Etching, Defect detection

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Proceedings Article | 1 November 2007 Paper

Paper

The study for close correlation of mask and wafer to optimize wafer field CD uniformity

Munsik Kim, Jaesung Kang, Shinchul Kang, Goomin Jeong, Yongkyoo Choi, Oscar Han

Proceedings Volume 6730, 67304V (2007) https://doi.org/10.1117/12.746846

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Optical testing, Wafer-level optics, Reliability, Scatterometry, Quartz, Transmittance

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Proceedings Article | 25 October 2007 Paper

Paper

Mask inspection method for 45nm node device

Sunghyun Oh, Yongkyoo Choi, Daeho Hwang, Goomin Jeong, Oscar Han

Proceedings Volume 6730, 673029 (2007) https://doi.org/10.1117/12.746864

KEYWORDS: Inspection, Photomasks, Reflectivity, Critical dimension metrology, Wafer-level optics, Pellicles, Light, Semiconducting wafers, Defect inspection, Resolution enhancement technologies

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Proceedings Article | 15 May 2007 Paper

Paper

The optimization of CD uniformity and measurement on mask and wafer

Yongkyoo Choi, Munsik Kim, Oscar Han

Proceedings Volume 6607, 66071W (2007) https://doi.org/10.1117/12.728979

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Cadmium, Scanning electron microscopy, Line edge roughness, Transmittance, Optical lithography, Image filtering, Image enhancement

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Proceedings Article | 5 April 2007 Paper

Paper

The study to enhance the mask global CD uniformity by removing local CD variation

Yongkyoo Choi, Munsik Kim, Oscar Han

Proceedings Volume 6518, 65183E (2007) https://doi.org/10.1117/12.712848

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Scanning electron microscopy, Cadmium, Transmittance, Optical lithography, Photoresist processing, Error analysis, Scatter measurement

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Proceedings Article | 20 October 2006 Paper

Paper

CD measurement evaluation on periodic patterns between optic tools and CD-SEM

Yongkyoo Choi, Munsik Kim, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 63491N (2006) https://doi.org/10.1117/12.686461

KEYWORDS: Critical dimension metrology, Scatterometry, Photomasks, Scanning electron microscopy, Deep ultraviolet, Image enhancement, Metrology, Wafer-level optics, Transmittance, Calibration

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Proceedings Article | 20 October 2006 Paper

Paper

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 634944 (2006) https://doi.org/10.1117/12.686473

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Image filtering, Line edge roughness, Anisotropic filtering, Time metrology, Anisotropic diffusion, Scatterometry, Metrology

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Proceedings Article | 20 May 2006 Paper

Paper

The CD measuring repeatability enhancement by intensity gradient

Yongkyoo Choi, Sangpyo Kim, Munsik Kim, Oscar Han

Proceedings Volume 6283, 62832F (2006) https://doi.org/10.1117/12.681789

KEYWORDS: Critical dimension metrology, Image filtering, Nonlinear filtering, Scanning electron microscopy, Image enhancement, Diffusion, Anisotropic filtering, Photomasks, Image processing, Image resolution

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Proceedings Article | 24 March 2006 Paper

Paper

The study to enhance the accuracy of FIB repair on mask pattern of DRAM

Yongkyoo Choi, Heecheon Kim, Sangchul Kim, Oscar Han

Proceedings Volume 6152, 61522H (2006) https://doi.org/10.1117/12.656270

KEYWORDS: Scanning electron microscopy, Image processing, Image enhancement, Diffusion, Image filtering, Photomasks, Image quality, Nonlinear filtering, Raster graphics, Feature extraction

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Proceedings Article | 5 November 2005 Paper

Paper

Image enhancement technology to get fine defect image for FIB

Yongkyoo Choi, Heecheon Kim, Oscar Han

Proceedings Volume 5992, 59921C (2005) https://doi.org/10.1117/12.632027

KEYWORDS: Scanning electron microscopy, Image processing, Image enhancement, Diffusion, Image filtering, Nonlinear filtering, Inspection, Image segmentation, Photomasks, Defect detection

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Proceedings Article | 6 December 2004 Paper

Paper

Mask defect inspection study with high-speed mask inspection system

Jeayoung Jun, Hyunchul Kim, Sungjin Choi, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569226

KEYWORDS: Inspection, Photomasks, Particles, Chromium, Defect inspection, Electron beam lithography, Critical dimension metrology, Nd:YAG lasers, Defect detection, Process control

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Proceedings Article | 6 December 2004 Paper

Paper

Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition

Sang Pyo Kim, Sang Chul Kim, Hee Chun Kim, Sang Lee Lee, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569387

KEYWORDS: Photomasks, Scanning electron microscopy, Semiconducting wafers, Printing, Photoresist processing, Carbon, Optical lithography, Quartz, Manufacturing, Inspection

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Proceedings Article | 6 December 2004 Paper

Paper

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569015

KEYWORDS: Ions, Ultraviolet radiation, Oxygen, Chemical analysis, Contamination, Phase shifts, Photomasks, Air contamination, Atomic force microscopy, Transmission electron microscopy

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Proceedings Article | 20 August 2004 Paper

Paper

Improvement of develop loading effect in the FEP-171 process

Tae-Joong Ha, Young-Mo Lee, Bo Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557709

KEYWORDS: Critical dimension metrology, Photomasks, Standards development, Error analysis, Photomask technology, Quartz, Semiconductors, Chemically amplified resists, Photoresist processing

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Proceedings Article | 17 December 2003 Paper

Paper

Cell projection EB exposure for Giga DRAM device mask

Jae Cheon Shin, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518332

KEYWORDS: Silicon, Photomasks, Semiconducting wafers, Etching, Electron beams, Vestigial sideband modulation, Beam shaping, Chemistry, Photoresist processing, Silicon films

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Proceedings Article | 17 December 2003 Paper

Paper

Mask patterning technology with KrF photomask repeater

Taejoong Ha, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518249

KEYWORDS: Photomasks, Optical proximity correction, Image processing, Image registration, Electron beam lithography, Mask making, Etching, Chromium, X-ray technology, Critical dimension metrology

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Proceedings Article | 26 June 2003 Paper

Paper

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485359

KEYWORDS: Photomasks, Image processing, Optical proximity correction, Mask making, Critical dimension metrology, Electron beam lithography, Photoresist processing, Image registration, X-ray technology, Contamination

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Proceedings Article | 27 December 2002 Paper

Paper

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467494

KEYWORDS: Photomasks, Image processing, Critical dimension metrology, Optical proximity correction, Mask making, Electron beam lithography, Photoresist processing, Contamination, Image registration, X-ray technology

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Proceedings Article | 30 July 2002 Paper

Paper

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474517

KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Mask making, Contamination, Coating, Scanning electron microscopy, X-ray technology, Distortion, Photoresist processing

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Proceedings Article | 11 March 2002 Paper

Paper

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458329

KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Mask making, Image registration, Contamination, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Coating

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Proceedings Article | 22 January 2001 Paper

Paper

Develop process optimization for CD uniformity improvement

Jae-Cheon Shin, Joon-Il Won, Ho-Yong Jung, Mun-Sik Kim, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410735

KEYWORDS: Photomasks, Photoresist processing, Fluctuations and noise, Etching, Critical dimension metrology, Mask making, Optical lithography, Chemical reactions, Plasma etching, Semiconducting wafers

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Proceedings Article | 22 January 2001 Paper

Paper

KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

Juhwan Kim, Sang-Chul Kim, Hee-Chun Kim, Sang-Lee Lee, Yong-Kyoo Choi, Young-Mog Ham, Oscar Han

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410705

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Optical lithography, Quartz, Printing, Opacity, Defect detection, Lithography, Defect inspection

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Proceedings Article | 25 August 1999 Paper

Paper

Stencil mask fabrication for cell projection e-beam lithography with silicon wafer

Jaeseung Choi, Seung-Ho Yi, Yongkyoo Choi, Hoon Huh, Jaejeong Kim

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360244

KEYWORDS: Photomasks, Silicon, Etching, Semiconducting wafers, Electron beam lithography, Wet etching, Mask making, Dry etching, Resistance, Oxides

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Proceedings Article | 7 July 1997 Paper

Paper

Optimal design of antireflective layer for DUV lithography and experimental results

Seung-Gol Lee, Kyung-Il Lee, Choong-Ki Seo, Jong-Ung Lee, Yongkyoo Choi, Byung-Ho Nam, Jeong Yu, Jae-Keun Jeong

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275842

KEYWORDS: Reflectivity, Lithography, Antireflective coatings, Photoresist materials, Deep ultraviolet, Optical properties, Visualization, Tolerancing, Optical lithography, Thin films

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Proceedings Article | 7 June 1996 Paper

Paper

More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation

Seung-Gol Lee, Kyung-Il Lee, Jong-Ung Lee, Yongkyoo Choi, Hong-Seok Kim

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240966

KEYWORDS: Photoresist materials, Computer simulations, Picture Archiving and Communication System, Optical lithography, Optical simulations, Dielectrics, Algorithm development, Light scattering, Diffraction, Diffraction gratings

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Proceedings Article | 26 May 1995 Paper

Paper

Optical proximity correction on attenuated phase-shifting photo mask for dense contact array

Yongkyoo Choi, Young Jin Song, Hong-Seok Kim, Woo Kim

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209264

KEYWORDS: Photomasks, Transmittance, Optical proximity correction, Optical lithography, Semiconducting wafers, Phase shifts, Phase shifting, Optical simulations, Super resolution, Optical filters

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Showing 5 of 32 publications

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