Mr. Yongming Wen Profile

Yongming Wen

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 20 November 2024 Poster + Paper

Reducing mask process correction time with hybrid rule-based and model-based solution

Xuan Zhu, Chia-Wei Chang, Yongming Wen, Ao Chen, Yu Zhu

Proceedings Volume 13216, 1321624 (2024) https://doi.org/10.1117/12.3034092

KEYWORDS: Model based design, Bias correction, Calibration, Manufacturing, Data modeling, Process modeling, Critical dimension metrology, Data corrections, Mask making

Read Abstract +

Model-based Mask Process Correction (MPC) is an effective method to ensure mask pattern fidelity, enhance mask feature resolution and improve mask Critical Dimension (CD) uniformity at advanced mask technology nodes. However, implementation of model-based MPC typically involves long cycle time of mask manufacturing. Rule-based MPC, on the other hand, has an advantage in the cycle time, but the accuracy normally cannot meet the specification. Therefore, improving MPC runtime without tolerating the accuracy is highly desired in the mask making process. A hybrid ruled-based and model-based MPC solution is introduced in this paper, which is aimed to maintain mask CD accuracy with reduced runtime. In this flow, a bias rule table is first automatically generated from a calibrated MPC model. The edges of the MPC target are then moved based on the rule table. The model-based MPC step is finally applied starting from the pre-moved edges, which gives fast convergence with minimum number of iterations. The mask correction accuracy and cycle time of this hybrid MPC flow is compared with full model-based MPC flow in detail.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years