Yoonsuk Hyun
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 2 May 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Printing, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 5 May 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Optical lithography, Contamination, Lithographic illumination, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Stray light, Stochastic processes, Fiber optic illuminators

Proceedings Article | 6 April 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reticles, Scanners, Particles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Optical lithography, Image processing, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Interferometers, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology, EUV optics

Showing 5 of 22 publications
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